SCHEMBL17067672

SCHEMBL17067672

C=CC(=O)OCCS(=O)(=O)CCS(=O)(=O)CCOC(=O)C=C

nearest known ligand 0.56

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.56
ALDH1A1 P00352 4/20 0.56
TP53 P04637 3/20 0.56
HIF1A Q16665 3/20 0.56
CYP3A4 P08684 2/20 0.56
HSD17B10 Q99714 1/20 0.56
HPGD P15428 1/20 0.50
THRB P10828 2/20 0.42
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
APEX1 P27695 1/20 0.31
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22198361 0.92 TSHR (0.59) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL30483489 0.88 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL16327 0.87 TSHR (0.56) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1302280 0.85 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
Ammonia Solution, Strong SCHEMBL1254117 0.85 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL165903 0.85 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL5053935 0.85 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL8861451 0.85 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL8861475 0.85 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL27620980 0.83 TSHR (0.56) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11667564-B2 Method of manufacturing an etched glass article AGFA-GEVAERT NV (BE) 2023-06-06 US disclosed
US-11667564-B2 Method of manufacturing an etched glass article AGFA-GEVAERT NV (BE) 2023-06-06 US disclosed
US-20210017068-A1 METHOD OF MANUFACTURING AN ETCHED GLASS ARTICLE AGFA-GEVAERT NV (BE) 2021-01-21 US disclosed
US-10662532-B2 Methods of manufacturing embossing elements AGFA-GEVAERT N.V. (BE) 2020-05-26 US disclosed
EP-3201278-B1 METHODS OF MANUFACTURING EMBOSSING ELEMENTS AGFA NV (BE) 2019-10-09 EP disclosed
EP-3201277-B1 DIGITAL FABRICATION OF METALLIC ARTICLES AGFA GEVAERT (BE) 2019-02-20 EP disclosed
US-20190031558-A1 METHOD OF MANUFACTURING AN ETCHED GLASS ARTICLE AGFA-GEVAERT NV (BE) 2019-01-31 US disclosed
US-10039193-B2 Etch-resistant inkjet inks for manufacturing conductive patterns AGFA-GEVAERT (BE) 2018-07-31 US disclosed
US-10039193-B2 Etch-resistant inkjet inks for manufacturing conductive patterns AGFA-GEVAERT (BE) 2018-07-31 US disclosed
US-9938420-B2 Digital fabrication of metallic articles AGFA-GEVAERT (BE) 2018-04-10 US disclosed
US-20170226355-A1 DIGITAL FABRICATION OF METALLIC ARTICLES AGFA-GEVAERT (BE) 2017-08-10 US disclosed
US-20170226355-A1 DIGITAL FABRICATION OF METALLIC ARTICLES AGFA-GEVAERT (BE) 2017-08-10 US disclosed
US-20170218520-A1 METHODS OF MANUFACTURING EMBOSSING ELEMENTS AGFA GRAPHICS NV (BE) 2017-08-03 US disclosed
US-20170218520-A1 METHODS OF MANUFACTURING EMBOSSING ELEMENTS AGFA GRAPHICS NV (BE) 2017-08-03 US disclosed
US-20170013723-A1 ETCH-RESISTANT INKJET INKS FOR MANUFACTURING CONDUCTIVE PATTERNS AGFA-GEVAERT (BE) 2017-01-12 US disclosed
US-20170013723-A1 ETCH-RESISTANT INKJET INKS FOR MANUFACTURING CONDUCTIVE PATTERNS AGFA-GEVAERT (BE) 2017-01-12 US disclosed
WO-2016050371-A1 DIGITAL FABRICATION OF METALLIC ARTICLES AGFA-GEVAERT (BE) 2016-04-07 WO disclosed
WO-2016050372-A1 METHODS OF MANUFACTURING EMBOSSING ELEMENTS AGFA GRAPHICS NV (BE) 2016-04-07 WO disclosed
WO-2015132020-A1 ETCH-RESISTANT INKJET INKS FOR MANUFACTURING CONDUCTIVE PATTERNS AGFA-GEVAERT (BE) 2015-09-11 WO disclosed
EP-2915856-A1 Etch-resistant inkjet inks for manufacturing conductive patterns AGFA-GEVAERT (BE) 2015-09-09 EP disclosed