SCHEMBL17070174

SCHEMBL17070174

CC(C)(OC(=O)C1CC2CCC1C2)C(C)(C)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.38
KCNQ3 O43525 1/20 0.37
KCNQ2 O43526 1/20 0.37
KCNQ4 P56696 1/20 0.37
KCNQ5 Q9NR82 1/20 0.37
HSD11B1 P28845 1/20 0.35
NPC1 O15118 3/20 0.35
RAB9A P51151 3/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.33
HPGD P15428 2/20 0.32
TSHR P16473 1/20 0.32
SLC6A3 Q01959 1/20 0.32
HSD17B10 Q99714 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
GFER P55789 1/20 0.32
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9908349 0.88 POLB (0.41) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL13923786 0.87 POLB (0.37) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL13668773 0.80 POLB (0.44) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL85684 0.80 POLB (0.44) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL2632930 0.76 POLB (0.41) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL16020229 0.75 POLB (0.36) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL1105067 0.75 POLB (0.44) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL17070168 0.75 POLB (0.41) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL9908343 0.75 POLB (0.41) POLBKCNQ3KCNQ2KCNQ4KCNQ5
SCHEMBL18467938 0.74 POLB (0.39) POLBKCNQ3KCNQ2KCNQ4KCNQ5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed