SCHEMBL17070185

SCHEMBL17070185

O=C1CC(OC(=O)C2CC3CCC2C3)CO1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
HTT P42858 2/20 0.34
KDM4E B2RXH2 1/20 0.34
HPGD P15428 2/20 0.33
KCNQ3 O43525 1/20 0.33
KCNQ2 O43526 1/20 0.33
KCNQ4 P56696 1/20 0.33
KCNQ5 Q9NR82 1/20 0.33
GAA P10253 2/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
THRB P10828 1/20 0.32
SLC6A3 Q01959 1/20 0.32
PTPN1 P18031 1/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
HSD11B1 P28845 1/20 0.31
TSHR P16473 1/20 0.31
P2RX7 Q99572 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32689262 0.78 POLB (0.47) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL15746168 0.77 PTPN1 (0.35) POLBHTTKDM4EPTPN1
SCHEMBL14535106 0.77 PTPN1 (0.32) HTTPTPN1
SCHEMBL12228749 0.75 POLB (0.44) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL9908419 0.75 POLB (0.39) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL879054 0.74 PTPN1 (0.30) PTPN1
SCHEMBL2064936 0.73 POLB (0.43) POLBL3MBTL1HTTHPGDKCNQ3
SCHEMBL9908400 0.72 ALDH1A1 (0.43) POLBL3MBTL1KDM4EHPGDMEN1
SCHEMBL12429881 0.72 PTPN1 (0.31) PTPN1
SCHEMBL12123509 0.72 PTPN1 (0.36) POLBHTTKDM4EGAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed