SCHEMBL9908419

SCHEMBL9908419

O=C(OC1CCOC1)C1CC2CCC1C2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.34
ADRA2A P08913 1/20 0.33
ADRA1A P35348 1/20 0.33
HSD11B1 P28845 1/20 0.33
ATM Q13315 1/20 0.33
HPGD P15428 2/20 0.32
KCNQ3 O43525 1/20 0.32
KCNQ2 O43526 1/20 0.32
KCNQ4 P56696 1/20 0.32
KCNQ5 Q9NR82 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MEN1 O00255 2/20 0.31
HTT P42858 2/20 0.31
KMT2A Q03164 2/20 0.31
GAA P10253 1/20 0.31
THRB P10828 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32689262 0.81 POLB (0.47) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL12228749 0.78 POLB (0.44) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL2064936 0.77 POLB (0.43) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL17070185 0.75 POLB (0.36) POLBL3MBTL1HSD11B1HPGDKCNQ3
SCHEMBL12228753 0.73 ATM (0.53) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL2515949 0.72 POLB (0.52) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL7647666 0.72 POLB (0.52) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL7647668 0.72 POLB (0.52) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL21646817 0.71 POLB (0.44) POLBL3MBTL1HSD11B1ATMHPGD
SCHEMBL13325141 0.71 POLB (0.38) POLBL3MBTL1HSD11B1ATMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed