Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17068813 | 0.81 | ALDH1A1 (0.38) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL5400136 | 0.75 | HPGD (0.39) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL11179657 | 0.75 | HPGD (0.39) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL17321571 | 0.75 | ALDH1A1 (0.40) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL19655056 | 0.74 | HPGD (0.41) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL5405968 | 0.74 | HPGD (0.45) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL11294328 | 0.73 | ALDH1A1 (0.38) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL14527045 | 0.72 | HPGD (0.40) | ALDH1A1HPGDLMNASMN1; SMN2MEN1 | |
| SCHEMBL6248656 | 0.72 | LMNA (0.33) | ALDH1A1HPGDLMNASMN1; SMN2KMT2A | |
| SCHEMBL17789877 | 0.72 | ALDH1A1 (0.34) | ALDH1A1HPGDLMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150253662-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |