SCHEMBL5400136

SCHEMBL5400136

CCC(CC)C1CC2CCC1C2

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.39
LMNA P02545 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
ALDH1A1 P00352 2/20 0.37
POLB P06746 1/20 0.33
KMT2A Q03164 3/20 0.32
HSD11B1 P28845 1/20 0.32
NPC1 O15118 1/20 0.31
MAPT P10636 1/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11066537 0.83 LMNA (0.33) HPGDLMNASMN1; SMN2ALDH1A1
SCHEMBL5405968 0.80 HPGD (0.45) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL17070950 0.75 ALDH1A1 (0.37) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL384170 0.73 HPGD (0.46) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL24583813 0.73 HPGD (0.46) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL24584550 0.73 HPGD (0.46) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL677904 0.73 HPGD (0.46) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL24584729 0.73 HPGD (0.46) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL17068813 0.72 ALDH1A1 (0.38) HPGDLMNASMN1; SMN2ALDH1A1POLB
SCHEMBL32688700 0.72 HPGD (0.43) HPGDLMNASMN1; SMN2ALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed