Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26078884 | 0.81 | ALDH1A1 (0.58) | GAAPOLBALDH1A1THRBMEN1 | |
| SCHEMBL1089318 | 0.79 | POLB (0.46) | GAAPOLBALDH1A1THRBMEN1 | |
| SCHEMBL1788313 | 0.78 | POLB (0.66) | GAAPOLBALDH1A1THRBMEN1 | |
| SCHEMBL17845447 | 0.77 | GAA (0.43) | GAAPOLBALDH1A1THRBMEN1 | |
| SCHEMBL76909 | 0.77 | ALDH1A1 (0.40) | GAAALDH1A1THRBMEN1KMT2A | |
| SCHEMBL17818866 | 0.76 | POLB (0.50) | GAAPOLBALDH1A1THRBMEN1 | |
| Methacrylic Acid SCHEMBL737597 | 0.75 | PKM (0.44) | GAAALDH1A1HSD11B1 | |
| Methacrylic Acid SCHEMBL27686097 | 0.75 | PKM (0.44) | GAAALDH1A1HSD11B1 | |
| SCHEMBL19766894 | 0.75 | ALDH1A1 (0.52) | GAAPOLBALDH1A1THRBMEN1 | |
| SCHEMBL13957641 | 0.74 | ALDH1A1 (0.36) | ALDH1A1TSHRHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2009498-B1 | Pattern forming method | FUJIFILM CORP (JP) | 2012-03-28 | — | — | EP | disclosed |
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |
| WO-2011111805-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-15 | — | — | WO | disclosed |
| EP-2009498-A1 | Pattern forming method | FUJIFILM Corporation (JP) | 2008-12-31 | — | — | EP | disclosed |