Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | DPP4 | P27487 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL684276 | 0.91 | ALDH1A1 (0.44) | ALDH1A1THRBMEN1KMT2AL3MBTL1 | |
| SCHEMBL14917102 | 0.91 | ALDH1A1 (0.38) | ALDH1A1THRBSCN9AMEN1KMT2A | |
| SCHEMBL677947 | 0.87 | ALDH1A1 (0.38) | ALDH1A1THRBMEN1KMT2AL3MBTL1 | |
| SCHEMBL22845698 | 0.87 | SCN9A (0.39) | ALDH1A1THRBSCN9AMEN1KMT2A | |
| SCHEMBL10150635 | 0.85 | ALDH1A1 (0.40) | ALDH1A1THRBMEN1KMT2AL3MBTL1 | |
| SCHEMBL75489 | 0.85 | ALDH1A1 (0.40) | ALDH1A1THRBMEN1KMT2AL3MBTL1 | |
| SCHEMBL5607929 | 0.84 | ALDH1A1 (0.44) | ALDH1A1THRBSCN9AMEN1KMT2A | |
| SCHEMBL20349638 | 0.84 | ALDH1A1 (0.54) | ALDH1A1THRBMEN1KMT2AL3MBTL1 | |
| SCHEMBL3797993 | 0.84 | ALDH1A1 (0.54) | ALDH1A1THRBMEN1KMT2AL3MBTL1 | |
| SCHEMBL22176775 | 0.84 | ALDH1A1 (0.39) | ALDH1A1THRBMEN1KMT2AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-04-21 | — | — | US | disclosed |
| CN-109790391-B | Curable resin composition for forming easily peelable film and method for producing same | 大阪有机化学工业株式会社 | 2022-04-12 | — | — | CN | disclosed |
| US-10457761-B2 | Polymer, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| CN-109790391-A | Curable resin composition for forming easily peelable film and method for producing same | 大阪有机化学工业株式会社 | 2019-05-21 | — | — | CN | disclosed |
| US-10266713-B2 | Particle dispersion liquid, aqueous ink, ink cartridge, recording apparatus, and recording method | FUJI XEROX CO., LTD. (JP) | 2019-04-23 | — | — | US | disclosed |
| US-10191373-B2 | Method for producing polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20110275774-A1 | ORGANOANTIMONY COMPOUND, PROCESS FOR PREPARING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH USE OF SAME, AND THE POLYMER | YAMAGO SHIGERU | 2011-11-10 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-8008414-B2 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| EP-1767539-B1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL CO LTD (JP) | 2011-07-27 | — | — | EP | disclosed |
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| EP-1767539-A1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL COMPANY, LTD. (JP) | 2007-03-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | AOC2, ODC1, MCM7 | ALDH1A1 1542/4885THRB 3751/4885SCN9A 4244/4885 |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | PYM1, MMAB, MEN1 | ALDH1A1 1455/4885THRB 941/4885SCN9A 2107/4885 |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ADH1A, ADH1C, ADH5 | ALDH1A1 6/4885THRB 4482/4885SCN9A 3213/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.