Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12332045 | 0.85 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL171954 | 0.85 | ALDH1A1 (0.34) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL2735092 | 0.84 | TSHR (0.42) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL22201018 | 0.84 | ALDH1A1 (0.35) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL13398471 | 0.83 | ALDH1A1 (0.37) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL2735073 | 0.83 | ALDH1A1 (0.37) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL13398256 | 0.81 | ALDH1A1 (0.38) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL16807392 | 0.81 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL5426220 | 0.80 | EPHX2 (0.38) | ALDH1A1THRBEPHX1 | |
| SCHEMBL16596832 | 0.80 | CHRM2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9051403-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9051403-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-8507174-B2 | Positive resist composition, pattern forming method using the composition, and compound for use in the composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507174-B2 | Positive resist composition, pattern forming method using the composition, and compound for use in the composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507172-B2 | Positive resist composition and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507172-B2 | Positive resist composition and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |
| US-8088550-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088550-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| EP-2177506-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION | Fujifilm Corporation (JP) | 2010-04-21 | — | — | EP | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| EP-2020615-A1 | Positive resist composition and pattern forming method | FUJIFILM Corporation (JP) | 2009-02-04 | — | — | EP | disclosed |
| US-20090023096-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
| US-20090023096-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | ZYX, CD79B, TERB1 | ALDH1A1 4248/4885THRB 2505/4885TSHR 1454/4885 |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | CROCC, ACTR2, MRE11 | ALDH1A1 4832/4885THRB 3569/4885TSHR 2667/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.