Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL171954 | 0.98 | ALDH1A1 (0.34) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL16807392 | 0.97 | ALDH1A1 (0.35) | ALDH1A1THRBTSHRFKBP1A | |
| SCHEMBL16807398 | 0.93 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL22733567 | 0.85 | ALDH1A1 (0.33) | ALDH1A1THRBTSHR | |
| SCHEMBL171600 | 0.84 | ALDH1A1 (0.36) | ALDH1A1THRBTSHREPHX1 | |
| SCHEMBL16181818 | 0.84 | ALDH1A1 (0.36) | ALDH1A1FKBP1A | |
| SCHEMBL22733020 | 0.83 | ALDH1A1 (0.31) | ALDH1A1TSHR | |
| SCHEMBL10281408 | 0.82 | GAA (0.33) | ALDH1A1EPHX1FKBP1A | |
| SCHEMBL22201019 | 0.81 | ALDH1A1 (0.34) | ALDH1A1THRBTSHR | |
| SCHEMBL8407098 | 0.81 | ALDH1A1 (0.34) | ALDH1A1THRBTSHREPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20200218154-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |