Sugi Predict

Sugi Predict / Compounds / SCHEMBL171820

SCHEMBL171820

SCHEMBL171820

O=C1c2ccccc2-c2ccccc2C1(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 4/20 0.51
▸ ESR2 Q92731 4/20 0.51
▸ MEN1 O00255 4/20 0.51
▸ KMT2A Q03164 4/20 0.51
▸ GPR55 Q9Y2T6 3/20 0.51
▸ LMNA P02545 3/20 0.51
▸ ALDH1A1 P00352 3/20 0.51
▸ MAPT P10636 2/20 0.51
▸ SMN1; SMN2 Q16637 2/20 0.51
▸ TSHR P16473 2/20 0.51
▸ CHRM2 P08172 1/20 0.51
▸ ADORA3 P0DMS8 1/20 0.51
▸ KCNH2 Q12809 1/20 0.51
▸ TP53 P04637 1/20 0.51
▸ TYMS P04818 1/20 0.51
▸ CYP3A4 P08684 1/20 0.51
▸ ALOX15 P16050 1/20 0.51
▸ HSD17B10 Q99714 1/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51
▸ S100A4 P26447 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13080599 0.85 S100A4 (0.53) MEN1KMT2ALMNAALDH1A1MAPT
SCHEMBL29365596 0.85 MEN1 (0.63) ESR1ESR2MEN1KMT2AGPR55
SCHEMBL15691572 0.85 MEN1 (0.63) ESR1ESR2MEN1KMT2AGPR55
SCHEMBL900116 0.85 MEN1 (0.63) ESR1ESR2MEN1KMT2AGPR55
SCHEMBL45826 0.85 MEN1 (0.63) ESR1ESR2MEN1KMT2AGPR55
Formaldehyde SCHEMBL972884 0.83 MEN1 (0.57) ESR1ESR2MEN1KMT2AGPR55
Bicarbonate SCHEMBL4853074 0.81 MEN1 (0.55) ESR1ESR2MEN1KMT2AGPR55
SCHEMBL30289963 0.81 MEN1 (0.54) ESR1ESR2MEN1KMT2AGPR55
SCHEMBL649568 0.81 MEN1 (0.54) ESR1ESR2MEN1KMT2AGPR55
SCHEMBL6756888 0.81 MEN1 (0.59) ESR1ESR2MEN1KMT2AGPR55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283433-B2 Polycarbonate resin and electrophotographic photosensitive body using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-10-09 — — US disclosed
US-8283433-B2 Polycarbonate resin and electrophotographic photosensitive body using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-10-09 — — US disclosed
EP-2048180-B1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL CO (JP) 2012-03-07 — — EP disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 — — US disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 — — US disclosed
US-20100316950-A1 COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-12-16 — — US disclosed
US-20100316950-A1 COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-12-16 — — US disclosed
US-20100047703-A1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-25 — — US disclosed
US-20100047703-A1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-25 — — US disclosed
EP-2048180-A1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-04-15 — — EP disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 — — US disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 — — US disclosed