Formaldehyde

Formaldehyde

SCHEMBL972884

C=O.Oc1ccc(C2(c3ccc(O)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.57

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.57
KMT2A Q03164 5/20 0.57
LMNA P02545 3/20 0.57
MAPT P10636 2/20 0.57
SMN1; SMN2 Q16637 2/20 0.57
KDM4E B2RXH2 2/20 0.57
OPRK1 P41145 1/20 0.57
ESR1 P03372 3/20 0.51
ESR2 Q92731 3/20 0.51
GPR55 Q9Y2T6 3/20 0.51
TDP1 Q9NUW8 2/20 0.51
CHRM2 P08172 1/20 0.51
ADORA3 P0DMS8 1/20 0.51
KCNH2 Q12809 1/20 0.51
ALDH1A1 P00352 1/20 0.51
TP53 P04637 1/20 0.51
TYMS P04818 1/20 0.51
CYP3A4 P08684 1/20 0.51
ALOX15 P16050 1/20 0.51
TSHR P16473 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL900116 0.94 MEN1 (0.63) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL29365596 0.94 MEN1 (0.63) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL45826 0.94 MEN1 (0.63) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL15691572 0.94 MEN1 (0.63) MEN1KMT2ALMNAMAPTSMN1; SMN2
Bicarbonate SCHEMBL4853074 0.90 MEN1 (0.55) MEN1KMT2ALMNAMAPTSMN1; SMN2
Phenol SCHEMBL8103114 0.90 MEN1 (0.59) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL6756888 0.90 MEN1 (0.59) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL25230386 0.88 MEN1 (0.57) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL12938480 0.88 MEN1 (0.57) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL516630 0.87 MEN1 (0.52) MEN1KMT2ALMNAMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7871761-B2 Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-18 US disclosed
US-20080032231-A1 Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern SHIN-ETSU CHEMICAL CO., LTD. 2008-02-07 US disclosed