SCHEMBL1719094

SCHEMBL1719094

C=C(C)CO[Si](C)(C)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR174 Q9BXC1 1/20 0.37
MAPT P10636 4/20 0.36
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
NPSR1 Q6W5P4 2/20 0.33
LMNA P02545 2/20 0.33
ALOX12 P18054 1/20 0.33
PAX8 Q06710 1/20 0.33
ALOX15 P16050 2/20 0.32
HSD17B10 Q99714 2/20 0.32
KDM4E B2RXH2 1/20 0.32
USP2 O75604 1/20 0.32
TP53 P04637 1/20 0.32
POLB P06746 1/20 0.32
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HPGD P15428 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1943280 0.82 GPR174 (0.38) GPR174MAPTESR1ESR2MEN1
SCHEMBL15453577 0.80 GPR174 (0.35) GPR174MAPTESR1ESR2MEN1
SCHEMBL6115886 0.79 GPR174 (0.36) GPR174MAPTESR1ESR2MEN1
SCHEMBL9102975 0.79 GPR174 (0.36) GPR174MAPTESR1ESR2MEN1
SCHEMBL6115530 0.78 GPR174 (0.36) GPR174MAPTMEN1KMT2ANPSR1
SCHEMBL6117250 0.77 GPR174 (0.35) GPR174MAPTMEN1KMT2ANPSR1
SCHEMBL8940570 0.77 SMYD2 (0.36) GPR174MAPTMEN1KMT2ANPSR1
SCHEMBL2349819 0.75 ESR1 (0.35) MAPTESR1ESR2
SCHEMBL840792 0.74 MAPT (0.41) GPR174MAPTESR1ESR2MEN1
SCHEMBL106512 0.73 ESR1 (0.37) MAPTESR1ESR2NPSR1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9946158-B2 Composition for forming resist underlayer film for nanoimprint NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-04-17 US disclosed
EP-2461350-B1 USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2018-02-28 EP disclosed
US-20150099070-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT NISSAN CHEMICAL IND LTD (JP) 2015-04-09 US disclosed
EP-2461350-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2012-06-06 EP disclosed
US-20120128891-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-05-24 US disclosed
US-8148565-B2 Method of manufacturing an organic silicon compound that contains a methacryloxy group or an acryloxy group DOW CORNING TORAY COMPANY, LTD. (JP) 2012-04-03 US disclosed
EP-1915384-B1 A METHOD OF MANUFACTURING AN ORGANIC SILICON COMPOUND THAT CONTAINS A METHACRYLOXY GROUP OR AN ACRYLOXY GROUP DOW CORNING TORAY CO LTD (JP) 2012-01-11 EP disclosed
US-20090306370-A1 Method Of Manufacturing An Organic Silicon Compound That Contains A Methacryloxy Group Or An Acryloxy Group DOW TORAY CO., LTD. (JP) 2009-12-10 US disclosed
EP-1915384-A1 A METHOD OF MANUFACTURING AN ORGANIC SILICON COMPOUND THAT CONTAINS A METHACRYLOXY GROUP OR AN ACRYLOXY GROUP Dow Corning Toray Co., Ltd. (JP) 2008-04-30 EP disclosed
WO-2007020932-A1 A METHOD OF MANUFACTURING AN ORGANIC SILICON COMPOUND THAT CONTAINS A METHACRYLOXY GROUP OR AN ACRYLOXY GROUP DOW CORNING TORAY CO., LTD. (JP) 2007-02-22 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090306370-A1 Method Of Manufacturing An Organic Silicon Compound That Contains A Methacryloxy Group Or An Acryloxy Group SIK1, SMS, SIK2 GPR174 2719/4885MAPT 861/4885ESR1 4013/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.