SCHEMBL1719574

SCHEMBL1719574

OCN(CO)CCN(CO)CO

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.41
EYA2 O00167 1/20 0.41
APP P05067 1/20 0.41
ACE P12821 1/20 0.41
KDM4E B2RXH2 2/20 0.39
ALOX15 P16050 2/20 0.39
LMNA P02545 1/20 0.39
CHRM2 P08172 1/20 0.39
ADRA2A P08913 1/20 0.39
TSHR P16473 1/20 0.39
DRD1 P21728 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
CYP2C19 P33261 1/20 0.39
ADRA1A P35348 1/20 0.39
DRD3 P35462 1/20 0.39
BLM P54132 1/20 0.39
PMP22 Q01453 1/20 0.39
SLC6A3 Q01959 1/20 0.39
HRH3 Q9Y5N1 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24359392 0.95 TDP1 (0.39) TDP1EYA2APPACEKDM4E
SCHEMBL1720709 0.82 EYA2 (0.30) TDP1EYA2APPACE
SCHEMBL1720051 0.82 EYA2 (0.30) TDP1EYA2APPACE
SCHEMBL1832 0.82
SCHEMBL2058427 0.82 MAPT (0.50) TDP1EYA2APPACEKDM4E
SCHEMBL22150935 0.82 CA12 (0.44) TDP1EYA2APPACEKDM4E
SCHEMBL2058477 0.82 MEN1 (0.37) TDP1EYA2APPACEKDM4E
SCHEMBL18562074 0.79 MAPT (0.47) TDP1EYA2APPACETSHR
SCHEMBL2057374 0.79 CA12 (0.35) TDP1EYA2APPACEMAPT
Hydrochloric Acid SCHEMBL4002211 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110981675-A Polyether solid propellant with ultralow glass transition temperature and preparation method thereof 湖北航天化学技术研究所 2020-04-10 CN claimed
CN-107190251-A A kind of gold plating liquid and preparation method thereof 广东东硕科技有限公司 2017-09-22 CN claimed
EP-1031884-B1 Resist stripping agent and process of producing semiconductor devices using the same MITSUBISHI GAS CHEMICAL CO (JP) 2012-01-11 EP claimed
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US claimed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US claimed
US-6638694-B2 Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) 2003-10-28 US claimed
US-20030186175-A1 RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME IKEMOTO KAZUTO (JP) 2003-10-02 US claimed
EP-1031884-A2 Resist stripping agent and process of producing semiconductor devices using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-30 EP claimed
US-4902439-A Detergent composition for washing off dyeings obtained with fibre-reactive dyes, process for the preparation thereof and use thereof CIBA-GEIGY CORPORATION (US) 1990-02-20 US claimed
EP-0287514-A1 Detergent for the after treatment of fiber reactive dyeings, process for its preparation and its use CIBA-GEIGY AG (CH) 1988-10-19 EP claimed
CN-116947660-B Polyhydroxy amine compound cross-linking agent for biological valve and biological valve 四川大学 2025-05-09 CN disclosed
CN-116947660-A Polyhydroxy amine compound cross-linking agent for biological valve and biological valve 四川大学 2023-10-27 CN disclosed
CN-110981675-B Polyether solid propellant with ultralow glass transition temperature and preparation method thereof 湖北航天化学技术研究所 2021-07-13 CN disclosed
CN-110981675-A Polyether solid propellant with ultralow glass transition temperature and preparation method thereof 湖北航天化学技术研究所 2020-04-10 CN disclosed
CN-110079795-A A kind of galvanized part surface treating agent and preparation method thereof 郑伟 2019-08-02 CN disclosed
US-20030186175-A1 RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME IKEMOTO KAZUTO (JP) 2003-10-02 US disclosed
EP-1031884-A2 Resist stripping agent and process of producing semiconductor devices using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-30 EP disclosed
US-4902439-A Detergent composition for washing off dyeings obtained with fibre-reactive dyes, process for the preparation thereof and use thereof CIBA-GEIGY CORPORATION (US) 1990-02-20 US disclosed
EP-0287514-A1 Detergent for the after treatment of fiber reactive dyeings, process for its preparation and its use CIBA-GEIGY AG (CH) 1988-10-19 EP disclosed
US-4631071-A REACTION PRODUCT OF MONOCARBOXYLIC ACID, ESTER WITH TERT-AMINE GROUP AND EPOXIDE MOBIL OIL CORPORATION (US) 1986-12-23 US disclosed