SCHEMBL1721072

SCHEMBL1721072

CN1CCN([Si](C)(C)C)CC1

nearest known ligand 0.41

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.36
CYP1A2 P05177 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
PHGDH O43175 1/20 0.32
MGLL Q99685 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9980594 0.89
SCHEMBL11789995 0.89
SCHEMBL11799504 0.79
SCHEMBL26639465 0.79
SCHEMBL17444463 0.78 ALOX15 (0.32) ALOX15CYP1A2TDP1
SCHEMBL17691378 0.78 ALOX15 (0.32) ALOX15CYP1A2TDP1
SCHEMBL11793916 0.76
SCHEMBL19717532 0.76 ALOX15 (0.31) ALOX15
SCHEMBL8629808 0.76
SCHEMBL7571225 0.76 CYP1A2 (0.47) ALOX15CYP1A2TDP1PHGDHMGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999734-B2 Cyclic amino compounds for low-k silylation AMERICAN AIR LIQUIDE, INC. (US) 2015-04-07 US claimed
EP-2406267-A2 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2012-01-18 EP claimed
US-20100233829-A1 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION AMERICAN AIR LIQUIDE INC. (US) 2010-09-16 US claimed
WO-2010104979-A2 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION L'AIR LIQUIDE - SOCIÉTÉ ANONYME POUR L'ÉTUDE ET L'EXPLOITATION DES PROCÉDES GEORGES CLAUDE (FR) 2010-09-16 WO claimed
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2021-04-27 US disclosed
EP-2650399-B1 High temperature atomic layer deposition of silicon oxide thin films VERSUM MAT US LLC (US) 2019-09-11 EP disclosed
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VERSUM MATERIALS US, LLC (US) 2019-06-20 US disclosed
US-10242864-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2019-03-26 US disclosed
US-20170256399-A9 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-09-07 US disclosed
US-20170256399-A9 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-09-07 US disclosed
US-20160365244-A1 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-12-15 US disclosed
US-20160365244-A1 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-12-15 US disclosed
EP-0413464-A2 Catalysts IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1991-02-20 EP disclosed
EP-0405786-A2 Catalysts IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1991-01-02 EP disclosed
US-4981827-A Catalysts IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1991-01-01 US disclosed
EP-0323082-A2 Catalysts IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1989-07-05 EP disclosed
EP-0113481-B1 FLUOROCARBON POLYMERS AND PROCESS FOR THEIR PREPARATION Tosoh Corporation (JP) 1988-03-16 EP disclosed
US-4661231-A ION EXCHANGE MEMBRANE TOYO SODA MANUFACTURING CO., LTD. (JP) 1987-04-28 US disclosed
US-4567206-A CATIONIC POLYMER MEMBRANES TOYO SODA MANUFACTURING CO., LTD. (JP) 1986-01-28 US disclosed
EP-0113481-A2 Fluorocarbon polymers and process for their preparation Tosoh Corporation (JP) 1984-07-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10242864-B2 High temperature atomic layer deposition of silicon oxide thin films SCN4A, RTN3, RPS4X ALOX15 2948/4885CYP1A2 1452/4885TDP1 4377/4885
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VIM, CDH1, ALDOA ALOX15 1188/4885CYP1A2 931/4885TDP1 2942/4885
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VIM, CDH1, ALDOA ALOX15 1188/4885CYP1A2 931/4885TDP1 2942/4885
US-20100233829-A1 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION CCNK, SBK3, DCK ALOX15 4740/4885CYP1A2 3952/4885TDP1 4389/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.