SCHEMBL17248024

SCHEMBL17248024

C=CCOc1ccc(C(C)(C)C)cc1[N+](=O)[O-]

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.43
CYP3A4 P08684 2/20 0.43
CYP2D6 P10635 2/20 0.43
ALDH1A1 P00352 7/20 0.43
HPGD P15428 2/20 0.43
NPSR1 Q6W5P4 2/20 0.43
KDM4E B2RXH2 2/20 0.42
TDP1 Q9NUW8 1/20 0.42
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
HTT P42858 4/20 0.40
MAPK1 P28482 2/20 0.40
NPC1 O15118 1/20 0.40
GLA P06280 1/20 0.40
CASP3 P42574 1/20 0.40
RAB9A P51151 1/20 0.40
SENP8 Q96LD8 1/20 0.40
SENP7 Q9BQF6 1/20 0.40
SENP6 Q9GZR1 1/20 0.40
MAPT P10636 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3154205 0.84 ALDH1A1 (0.45) ALDH1A1HPGDNPSR1KDM4ETDP1
SCHEMBL28663076 0.84 CYP1A2 (0.41) CYP1A2CYP3A4CYP2D6ALDH1A1HPGD
SCHEMBL26218843 0.82 LMNA (0.49) CYP1A2CYP3A4ALDH1A1HPGDNPSR1
SCHEMBL5640740 0.81 CYP1A2 (0.60) CYP1A2CYP3A4CYP2D6ALDH1A1HPGD
SCHEMBL10714683 0.80 ALDH1A1 (0.52) CYP1A2CYP3A4CYP2D6ALDH1A1HPGD
SCHEMBL29749978 0.80 ALDH1A1 (0.52) CYP1A2CYP3A4CYP2D6ALDH1A1HPGD
SCHEMBL4237765 0.79 ALDH1A1 (0.47) ALDH1A1HPGDNPSR1KDM4EHTT
SCHEMBL22215853 0.79 ALDH1A1 (0.46) CYP2D6ALDH1A1HPGDNPSR1KDM4E
SCHEMBL28338065 0.78 CYP3A4 (0.40) CYP1A2CYP3A4CYP2D6ALDH1A1HPGD
SCHEMBL5644726 0.78 ALDH1A1 (0.50) CYP1A2CYP3A4CYP2D6ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150325442-A1 Formulations of Solutions and Processes for Forming a Substrate Including a Dopant DYNALOY, LLC (US) 2015-11-12 US disclosed