SCHEMBL1724938

SCHEMBL1724938

CC=CC(=O)OCC(O)COc1ccc(CC(C)(C)c2ccc(OCC(O)COC(=O)C=CC)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.41
POLB P06746 2/20 0.41
MAPT P10636 2/20 0.41
NPSR1 Q6W5P4 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
CYP1A2 P05177 1/20 0.40
RECQL P46063 1/20 0.39
HSD17B10 Q99714 1/20 0.39
HTT P42858 1/20 0.39
HIF1A Q16665 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
CASR P41180 2/20 0.38
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
AR P10275 1/20 0.38
USP2 O75604 1/20 0.36
ALDH1A1 P00352 1/20 0.36
ADRB2 P07550 1/20 0.36
ADRB1 P08588 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5665294 0.87 ESR1 (0.41) POLBCYP1A2ESR1ESR2ADRB2
SCHEMBL59992 0.87 HTT (0.52) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL3194813 0.84 LMNA (0.48) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL5664450 0.82 CYP1A2 (0.45) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL7517507 0.82 POLB (0.46) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL10396173 0.81 MAPT (0.43) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL5081247 0.81 KMT2A (0.50) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL5492057 0.80 POLB (0.45) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL10480065 0.79 ADRB2 (0.35) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL9177632 0.79 MEN1 (0.49) LMNAPOLBMAPTNPSR1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1439423-B1 Photosensitive lithographic printing plate FUJIFILM CORP (JP) 2012-01-11 EP disclosed
US-7291443-B2 Polymerizable composition and image-recording material using the same FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
EP-1507170-A2 Polymerizable composition and image-recording material using the same Fuji Photo Film Co., Ltd. (JP) 2005-02-16 EP disclosed
US-20050026082-A1 Polymerizable composition and image-recording material using the same FUJI PHOTO FILM CO., LTD. 2005-02-03 US disclosed
EP-1439423-A2 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2004-07-21 EP disclosed
US-6638687-B2 Comprises photosensitive polymer layer over aluminum substrate; sludge- and blinding-free; electroconductivity; high strength; durability FUJI PHOTO FILM CO., LTD. (JP) 2003-10-28 US disclosed
US-20030049564-A1 Method for preparing lithographic printing plate FUJIFILM CORPORATION (JP) 2003-03-13 US disclosed