⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9308379 | 0.81 | — | — | |
| SCHEMBL17249712 | 0.73 | ALDH1A1 (0.50) | — | |
| SCHEMBL29281761 | 0.70 | — | — | |
| SCHEMBL2528318 | 0.70 | — | — | |
| SCHEMBL8422452 | 0.70 | — | — | |
| SCHEMBL8422450 | 0.69 | — | — | |
| SCHEMBL1804827 | 0.69 | — | — | |
| SCHEMBL4941379 | 0.67 | ALDH1A1 (0.43) | — | |
| SCHEMBL3475630 | 0.67 | ALDH1A1 (0.43) | — | |
| SCHEMBL419021 | 0.67 | ALDH1A1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9290623-B2 | Composition for forming silicon-containing resist underlayer film having cyclic diester group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-20150322212-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-12 | — | — | US | disclosed |