SCHEMBL17249706

SCHEMBL17249706

[3H]O[Si](COC(=O)C(C)(C)C)(O[3H])O[3H]

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.37
GAA P10253 2/20 0.33
POLB P06746 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
L3MBTL1 Q9Y468 4/20 0.32
RAB9A P51151 3/20 0.32
NPC1 O15118 3/20 0.32
CASP3 P42574 1/20 0.32
SENP8 Q96LD8 1/20 0.32
SENP7 Q9BQF6 1/20 0.32
SENP6 Q9GZR1 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
BTN3A1 O00481 3/20 0.32
MAPT P10636 2/20 0.31
KDM4E B2RXH2 1/20 0.31
PKM P14618 1/20 0.31
APEX1 P27695 1/20 0.31
RECQL P46063 1/20 0.31
ALDH1A1 P00352 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17249704 0.82 CYP4F2 (0.33)
SCHEMBL17249713 0.76 POLB (0.39) PRKCAGAAPOLBNPSR1
SCHEMBL17249705 0.75
SCHEMBL15315078 0.70 PRKCA (0.37) PRKCAGAAPOLBNPSR1L3MBTL1
SCHEMBL12610865 0.68 PRKCA (0.40) PRKCAGAAPOLBNPSR1
SCHEMBL681950 0.68 PRKCA (0.46) PRKCAGAAPOLBNPSR1NPC1
SCHEMBL4258156 0.68 POLB (0.48) PRKCAGAAPOLBNPSR1NPC1
SCHEMBL17249740 0.67 POLB (0.35) PRKCAGAAPOLBNPSR1
SCHEMBL8816807 0.67 PRKCA (0.42) PRKCAGAAPOLBNPSR1BTN3A1
SCHEMBL28860692 0.67 PRKCA (0.35) PRKCAGAAPOLBNPSR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9290623-B2 Composition for forming silicon-containing resist underlayer film having cyclic diester group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-03-22 US disclosed
US-20150322212-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-11-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150322212-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP ASH2L, SRRM2, CCNT1 PRKCA 3006/4885GAA 3049/4885POLB 508/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.