⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10966085 | 0.84 | ALDH1A1 (0.38) | — | |
| SCHEMBL27419581 | 0.83 | CHRM2 (0.44) | — | |
| SCHEMBL12744044 | 0.79 | ALDH1A1 (0.35) | — | |
| SCHEMBL5668573 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL5668576 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL16550656 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL10915445 | 0.77 | ALDH1A1 (0.33) | — | |
| SCHEMBL8537372 | 0.76 | — | — | |
| SCHEMBL16359263 | 0.76 | HPGD (0.44) | — | |
| SCHEMBL19388825 | 0.75 | TDP1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2378529-B1 | COMPOSITION FOR FORMING HIGH-DIELECTRIC FILM FOR FILM CAPACITOR | DAIKIN IND LTD (JP) | 2021-05-19 | — | — | EP | disclosed |
| US-20160264742-A1 | FILM AND METHOD FOR PRODUCING SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2016-09-15 | — | — | US | disclosed |
| EP-3064537-A1 | FILM AND METHOD FOR PRODUCING SAME | Daikin Industries, Ltd. (JP) | 2016-09-07 | — | — | EP | disclosed |
| US-20150368413-A1 | HIGH DIELECTRIC FILM | DAIKIN INDUSTRIES, LTD. (JP) | 2015-12-24 | — | — | US | disclosed |
| US-20150332855-A1 | MULTILAYER FILM | DAIKIN INDUSTRIES, LTD. (JP) | 2015-11-19 | — | — | US | disclosed |
| CN-101501091-B | Process for production of oxymethylene copolymers | MITSUBISHI GAS CHEMICAL CO | 2011-09-07 | — | — | CN | disclosed |
| CN-101501091-A | Process for production of oxymethylene copolymers | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-08-05 | — | — | CN | disclosed |