Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 13/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.58 |
| ▸ | LMNA | P02545 | 4/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.58 |
| ▸ | HPGD | P15428 | 5/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | AURKA | O14965 | 1/20 | 0.51 |
| ▸ | AURKB | Q96GD4 | 1/20 | 0.51 |
| ▸ | TTR | P02766 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | GAA | P10253 | 3/20 | 0.48 |
| ▸ | POLB | P06746 | 3/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 2/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11422536 | 0.98 | ALDH1A1 (0.56) | ALDH1A1KDM4ELMNASMN1; SMN2HPGD | |
| SCHEMBL1108433 | 0.81 | ALDH1A1 (0.58) | ALDH1A1KDM4ELMNASMN1; SMN2HPGD | |
| SCHEMBL11422534 | 0.80 | ALDH1A1 (0.56) | ALDH1A1KDM4ELMNASMN1; SMN2HPGD | |
| SCHEMBL11436403 | 0.78 | KDM4E (0.48) | ALDH1A1KDM4ELMNASMN1; SMN2HPGD | |
| SCHEMBL9568545 | 0.76 | AURKB (0.58) | ALDH1A1HSD17B10AURKAAURKBTTR | |
| SCHEMBL9568585 | 0.76 | AURKB (0.58) | ALDH1A1HSD17B10AURKAAURKBTTR | |
| SCHEMBL9568549 | 0.76 | AURKB (0.58) | ALDH1A1SMN1; SMN2HSD17B10AURKAAURKB | |
| SCHEMBL9568598 | 0.76 | AURKB (0.58) | ALDH1A1SMN1; SMN2HSD17B10AURKAAURKB | |
| SCHEMBL9813360 | 0.76 | AURKA (0.72) | ALDH1A1HPGDHSD17B10AURKAAURKB | |
| SCHEMBL5711912 | 0.76 | AURKA (0.77) | ALDH1A1KDM4ELMNAHPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4415650-A | VACUUM DEPOSITING AN ORGANIC AND AN INORGANIC COMPOUND ON A SUPPORT; THERMOSENSITIVITY; LASERS | FUJI PHOTO FILM CO., LTD. (JP) | 1983-11-15 | — | — | US | claimed |
| JP-5222028-A | — | — | None | — | — | JP | disclosed |
| EP-1142707-B2 | Heat-sensitive lithographic printing plate precursor | FUJIFILM CORP (JP) | 2011-11-30 | — | — | EP | disclosed |
| EP-1586461-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2008-03-05 | — | — | EP | disclosed |
| EP-1593522-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2008-02-27 | — | — | EP | disclosed |
| EP-1516748-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2007-12-19 | — | — | EP | disclosed |
| US-20070248911-A1 | Pattern forming method and bilayer film | IWASAWA HARUO | 2007-10-25 | — | — | US | disclosed |
| US-7244549-B2 | Pattern forming method and bilayer film | JSR CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| EP-1518712-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2007-01-10 | — | — | EP | disclosed |
| EP-1464514-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1247644-A2 | Support for lithographic printing plate and original forme for lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-09 | — | — | EP | disclosed |
| US-20020033108-A1 | Heat-sensitive lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2002-03-21 | — | — | US | disclosed |
| EP-1142707-A1 | Heat-sensitive lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-10-10 | — | — | EP | disclosed |
| JP-H05222028-A | PRODUCTION OF 4-SULFONAPHTHALIC ACID ANHYDRIDE | NIPPON STEEL CHEM CO LTD | 1993-08-31 | — | — | JP | disclosed |
| US-4415650-A | VACUUM DEPOSITING AN ORGANIC AND AN INORGANIC COMPOUND ON A SUPPORT; THERMOSENSITIVITY; LASERS | FUJI PHOTO FILM CO., LTD. (JP) | 1983-11-15 | — | — | US | disclosed |
| US-4317682-A | A SULFONAMIDE AND AMINE-CONTAINING AROMATIC POLYCYCLIC COMPOUND AS FLOW CONTROL AGENTS IN PRINTING INKS AND PAINTS; STORAGE STABILITY | TOYO INK MANUFACTURING CO. LTD. (JP) | 1982-03-02 | — | — | US | disclosed |
| US-4212813-A | OXIDIZING ACENAPHTHENES, COBALT COMPOUND CATALYST | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1980-07-15 | — | — | US | disclosed |
| US-4171459-A | Manufacture of α-naphthol | BASF AKTIENGESELLSCHAFT (DE) | 1979-10-16 | — | — | US | disclosed |
| US-4143050-A | MANUFACTURE OF 3-HALOSULFONYLTHIOPHENE-CARBOXYLIC ACID COMPOUNDS | BASF AKTIENGESELLSCHAFT (DE) | 1979-03-06 | — | — | US | disclosed |
| US-4117019-A | MANUFACTURE OF O-BENZYLTOLUENES | BASF AKTIENGESELLSCHAFT (DE) | 1978-09-26 | — | — | US | disclosed |