SCHEMBL17320290

SCHEMBL17320290

O=C(CO)C1C2CC3C1OC(=O)C3C2C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17320300 0.87 POLB (0.39) POLBTDP1
SCHEMBL17320286 0.84 KMT2A (0.34)
SCHEMBL17320477 0.78 PPM1B (0.41) POLBTDP1
SCHEMBL1346452 0.78 POLB (0.33) POLBTDP1
SCHEMBL4382178 0.78 POLB (0.37) POLBTDP1
SCHEMBL1348671 0.77 LMNA (0.32) POLBTDP1
SCHEMBL14204522 0.76 POLB (0.36) POLBTDP1
SCHEMBL11976381 0.76 POLB (0.36) POLBTDP1
SCHEMBL14230474 0.76 POLB (0.36) POLBTDP1
SCHEMBL7814108 0.76 POLB (0.36) POLBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160252818-A9 PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD JSR CORPORATION (JP) 2016-09-01 US disclosed
US-20150355550-A1 PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD JSR CORPORATION (JP) 2015-12-10 US disclosed