Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17320482 | 0.88 | KMT2A (0.36) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL17320290 | 0.84 | POLB (0.33) | — | |
| SCHEMBL17320477 | 0.83 | PPM1B (0.41) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL12009855 | 0.82 | KMT2A (0.35) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL12972094 | 0.80 | ALDH1A1 (0.33) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL14001998 | 0.80 | KMT2A (0.34) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL962818 | 0.80 | KMT2A (0.34) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL22855676 | 0.80 | KMT2A (0.34) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL3414738 | 0.80 | KMT2A (0.34) | KMT2AMEN1ALDH1A1GLAHPGD | |
| SCHEMBL12014001 | 0.80 | KMT2A (0.34) | KMT2AMEN1ALDH1A1GLAHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160252818-A9 | PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD | JSR CORPORATION (JP) | 2016-09-01 | — | — | US | disclosed |
| US-20150355550-A1 | PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |