SCHEMBL1733128

SCHEMBL1733128

CC1C2C=CC(C2)C1(C)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.39
TDP1 Q9NUW8 3/20 0.39
GAA P10253 1/20 0.39
MEN1 O00255 1/20 0.36
POLB P06746 1/20 0.36
KMT2A Q03164 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
KDM4E B2RXH2 2/20 0.34
LMNA P02545 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.33
NPY1R P25929 1/20 0.33
CHRNB2 P17787 1/20 0.32
SLC6A2 P23975 1/20 0.32
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32
CHRNA4 P43681 1/20 0.32
SLC6A3 Q01959 1/20 0.32
CCR2 P41597 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2778813 0.78 ALDH1A1 (0.34) ALDH1A1TDP1GAAMEN1POLB
SCHEMBL1078417 0.73 ALDH1A1 (0.44) ALDH1A1TDP1GAAMEN1POLB
SCHEMBL249317 0.68
SCHEMBL1733208 0.67 ALDH1A1 (0.36) ALDH1A1TDP1GAAMEN1POLB
SCHEMBL18560024 0.65
SCHEMBL4248753 0.64 MAOA (0.34) ALDH1A1TDP1GAALMNASLC6A2
SCHEMBL1732686 0.64 OPRM1 (0.33) ALDH1A1GAAMEN1KMT2ALMNA
SCHEMBL1733068 0.64 TDP1 (0.33) ALDH1A1TDP1MEN1POLBKMT2A
SCHEMBL1741105 0.63 MAOB (0.39)
SCHEMBL8706579 0.62 TDP1 (0.43) ALDH1A1TDP1GAAMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9242407-B2 Resin for thermal imprinting SCIVAX CORPORATION (JP) 2016-01-26 US disclosed
US-20140339735-A1 RESIN FOR THERMAL IMPRINTING SCIVAX CORPORATION (JP) 2014-11-20 US disclosed
US-8721950-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2014-05-13 US disclosed
US-8597769-B2 Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article MARUZEN PETROCHEMICAL CO. LTD. (JP) 2013-12-03 US disclosed
US-20130056906-A1 RESIN FOR THERMAL IMPRINT MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-8324332-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2012-12-04 US disclosed
EP-1958970-B1 USE OF RESINS FOR THERMAL IMPRINTING SCIVAX CORP (JP) 2011-11-23 EP disclosed
US-20100310830-A1 Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-12-09 US disclosed
EP-2221162-A1 ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE Maruzen Petrochemical CO., LTD. (JP) 2010-08-25 EP disclosed
US-20100189985-A1 THERMAL-IMPRINTING RESIN, THERMAL-IMPRINTING-RESIN SOLUTION, THERMAL-IMPRINTING INJECTION-MOLDED BODY, THERMAL-IMPRINTING THIN FILM AND PRODUCTION METHOD THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
US-20100189984-A1 THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
EP-2163565-A1 RESIN FOR THERMAL IMPRINTING, RESIN SOLUTION FOR THERMAL IMPRINTING, INJECTION MOLDED BODY FOR THERMAL IMPRINTING, THIN FILM FOR THERMAL IMPRINTING, AND PROCESS FOR PRODUCING THE THIN FILM MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-03-17 EP disclosed
US-20100019410-A1 Resin for Thermal Imprinting SCIVAX CORPORATION (JP) 2010-01-28 US disclosed
US-20100013122-A1 Resin for Thermal Imprint SCIVAX CORPORATON (JP) 2010-01-21 US disclosed
EP-1958970-A1 RESIN FOR THERMAL IMPRINTING Scivax Corporation (JP) 2008-08-20 EP disclosed
EP-1930349-A1 RESIN FOR THERMAL IMPRINT Scivax Corporation (JP) 2008-06-11 EP disclosed