SCHEMBL17341911

SCHEMBL17341911

CCCCCCC(=O)/C(=N\OC(=O)N(C)c1ccccc1)c1nc2ccccc2s1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 3/20 0.45
▸ HPGD P15428 3/20 0.45
▸ MEN1 O00255 2/20 0.44
▸ KMT2A Q03164 2/20 0.44
▸ HDAC1 Q13547 2/20 0.43
▸ HDAC2 Q92769 2/20 0.43
▸ HDAC3 O15379 1/20 0.43
▸ HDAC4 P56524 1/20 0.43
▸ HDAC7 Q8WUI4 1/20 0.43
▸ HDAC10 Q969S8 1/20 0.43
▸ HDAC11 Q96DB2 1/20 0.43
▸ HDAC8 Q9BY41 1/20 0.43
▸ HDAC6 Q9UBN7 1/20 0.43
▸ HDAC9 Q9UKV0 1/20 0.43
▸ HDAC5 Q9UQL6 1/20 0.43
▸ ALDH1A1 P00352 5/20 0.41
▸ NPC1 O15118 4/20 0.41
▸ RAB9A P51151 4/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.41
▸ MAPT P10636 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16381779 0.79 HDAC1 (0.43) GAAHPGDMEN1KMT2AHDAC1
SCHEMBL17341900 0.76 MEN1 (0.38) GAAHPGDMEN1KMT2AALDH1A1
SCHEMBL17341915 0.74 PAX8 (0.46) GAAHPGDMEN1KMT2AALDH1A1
SCHEMBL30093447 0.73 DRD2 (0.62) GAAHPGDHDAC1HDAC2HDAC3
SCHEMBL3752137 0.73 DRD2 (0.62) GAAHPGDHDAC1HDAC2HDAC3
SCHEMBL1668218 0.73 DRD2 (0.62) GAAHPGDHDAC1HDAC2HDAC3
SCHEMBL28919882 0.73 DRD2 (0.62) GAAHPGDHDAC1HDAC2HDAC3
SCHEMBL17341916 0.72 TSHR (0.47) GAAHPGDMEN1KMT2AALDH1A1
SCHEMBL28919881 0.71 DRD2 (0.63) GAAHPGDALDH1A1NPC1RAB9A
Bromide SCHEMBL28956727 0.70 DRD2 (0.62) GAAHPGDALDH1A1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI GAA 2033/4885HPGD 4208/4885MEN1 607/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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