SCHEMBL17358252

SCHEMBL17358252

NS(=O)(=O)c1ccccc1C(=O)OC1C2CC3CC(C2)CC1C3

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 6/20 0.54
CA2 P00918 6/20 0.54
CA9 Q16790 5/20 0.54
CA5A P35218 2/20 0.54
HSD11B1 P28845 4/20 0.39
EPHX2 P34913 1/20 0.39
P2RX4 Q99571 1/20 0.38
P2RX7 Q99572 1/20 0.38
PTPN2 P17706 2/20 0.35
PTPN1 P18031 2/20 0.35
ALDH1A1 P00352 2/20 0.35
PTPRF P10586 1/20 0.35
KDM4E B2RXH2 1/20 0.35
POLB P06746 1/20 0.35
TSHR P16473 1/20 0.35
HSD17B10 Q99714 1/20 0.35
CA4 P22748 2/20 0.34
CA6 P23280 2/20 0.34
CA12 O43570 1/20 0.34
CYP2C9 P11712 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17358251 0.76 HSD11B1 (0.40) HSD11B1EPHX2PTPN2PTPN1ALDH1A1
SCHEMBL17358257 0.75 CA1 (0.54) CA1CA2CA9CA5AHSD11B1
SCHEMBL8837627 0.74 CA1 (0.56) CA1CA2CA9CA5APTPN2
SCHEMBL8548401 0.74 ALDH1A1 (0.64) CA1CA2CA9CA5APTPN2
SCHEMBL8837655 0.73 CA1 (0.55) CA1CA2CA9CA5APTPN2
SCHEMBL1397070 0.73 EPHX2 (0.39) HSD11B1EPHX2PTPN2PTPN1ALDH1A1
SCHEMBL28223255 0.72 CHRNA7 (0.49) HSD11B1EPHX2TSHRLMNA
SCHEMBL30362278 0.71 CA1 (1.00) CA1CA2CA9CA5AALDH1A1
SCHEMBL2181057 0.71 CA1 (1.00) CA1CA2CA9CA5AALDH1A1
SCHEMBL8507951 0.70 CA1 (0.68) CA1CA2CA9CA5AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9235118-B1 Patterning methods and methods of making a photoresist composition using a photoresist additive TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2016-01-12 US disclosed
US-20150370164-A1 Patterning Methods and Methods of Making a Photoresist Composition Using a Photoresist Additive TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2015-12-24 US disclosed