SCHEMBL17409206

SCHEMBL17409206

CCC(C)C(=O)NCCCOC(=O)c1ccccc1-c1c2ccc(=[N+](CC)CC)cc-2oc2cc(N(CC)CC)ccc12

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ TGM2 P21980 1/20 0.54
▸ MEN1 O00255 1/20 0.51
▸ USP2 O75604 1/20 0.51
▸ POLB P06746 1/20 0.51
▸ PPARG P37231 1/20 0.51
▸ BLM P54132 1/20 0.51
▸ KMT2A Q03164 1/20 0.51
▸ RXFP1 Q9HBX9 1/20 0.51
▸ NCOR2 Q9Y618 1/20 0.51
▸ FPR2 P25090 4/20 0.50
▸ NPY4R P50391 3/20 0.45
▸ CHRM1 P11229 2/20 0.44
▸ TLR7 Q9NYK1 1/20 0.42
▸ SLC6A2 P23975 1/20 0.41
▸ SLC6A4 P31645 1/20 0.41
▸ SLC6A3 Q01959 1/20 0.41
▸ AVPR2 P30518 3/20 0.40
▸ APLNR P35414 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17409279 0.88 TGM2 (0.53) TGM2MEN1USP2POLBPPARG
SCHEMBL22292200 0.88 USP2 (0.55) TGM2MEN1USP2POLBPPARG
Hydrochloric Acid SCHEMBL17626403 0.87 TGM2 (0.53) TGM2MEN1USP2POLBPPARG
Hydrochloric Acid SCHEMBL29539118 0.87 USP2 (0.54) TGM2MEN1USP2POLBPPARG
SCHEMBL17635836 0.86 TGM2 (0.53) TGM2MEN1USP2POLBPPARG
SCHEMBL13428258 0.86 USP2 (0.53) TGM2MEN1USP2POLBPPARG
SCHEMBL14667860 0.86 USP2 (0.53) TGM2MEN1USP2POLBPPARG
SCHEMBL18888026 0.86 USP2 (0.53) TGM2MEN1USP2POLBPPARG
SCHEMBL18350813 0.86 USP2 (0.53) TGM2MEN1USP2POLBPPARG
SCHEMBL10124264 0.86 USP2 (0.56) TGM2MEN1USP2POLBPPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160327859-A1 COLORING COMPOSITION, AND CURED FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, AND DYE MULTIMER, EACH USING THE COLORING COMPOSITION FUJIFILM CORPORATION (JP) 2016-11-10 — — US disclosed
US-20160004154-A1 RADIATION-SENSITIVE COLORED COMPOSITIONS, CURED COLORED FILMS, COLOR FILTERS, PROCESSES FOR FORMING COLORED PATTERNS, PROCESSES FOR PREPARING COLOR FILTERS, SOLID-STATE IMAGE SENSORS AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2016-01-07 — — US disclosed
Send feedback