SCHEMBL1741573

SCHEMBL1741573

C=CCN(C)CCS(=O)(=O)O

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.34
LSS P48449 6/20 0.33
PYCR1 P32322 1/20 0.32
PTGS1 P23219 1/20 0.31
PDE4A P27815 1/20 0.31
LMNA P02545 1/20 0.31
SLC6A6 P31641 1/20 0.31
CYP2C19 P33261 1/20 0.31
BLM P54132 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL500659 0.98 LTA4H (0.33) LTA4HLSSPYCR1PTGS1PDE4A
SCHEMBL29240817 0.88 LSS (0.37) LTA4HLSSMEN1KMT2A
SCHEMBL28866550 0.82 TSHR (0.31)
SCHEMBL28995279 0.82 PYCR1 (0.31) PYCR1PTGS1PDE4ALMNASLC6A6
Sulfuric Acid SCHEMBL5168347 0.80 PYCR1 (0.36) LSSPYCR1MEN1KMT2A
Sulfuric Acid SCHEMBL5321193 0.80 PYCR1 (0.36) LSSPYCR1MEN1KMT2A
SCHEMBL13439937 0.79 LTA4H (0.44) LTA4HPTGS1PDE4ALMNASLC6A6
Sulfuric Acid SCHEMBL29005692 0.79 MAPT (0.33) LSSPYCR1MEN1KMT2A
Sulfuric Acid SCHEMBL28075804 0.79 LSS (0.33) LSSPYCR1MEN1KMT2A
SCHEMBL3249715 0.78 KMT2A (0.35) PTGS1PDE4ALMNASLC6A6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7714064-B2 Controllable and rapid solubility rate of water-soluble polymeric films HARBIN LONGYI NEW MATERIAL TECHNOLOGY CO. LTD. (CN) 2010-05-11 US claimed
CN-1918698-B Cleaning liquid and cleaning method for substrate for semiconductor device MITSUBISHI CHEM CORP 2010-04-07 CN claimed
CN-100439426-C Nontacky latex products SUZUKI LATEX INDUSTRY CO LTD (JP) 2008-12-03 CN claimed
US-20080097029-A1 CONTROLLABLE AND RAPID SOLUBILITY RATE OF WATER-SOLUBLE POLYMERIC FILMS HARBIN LONGYI NEW MATERIAL TECHNOLOGY CO. LTD. (CN) 2008-04-24 US claimed
CN-1918698-A Cleaning liquid and cleaning method for substrate for semiconductor device MITSUBISHI CHEM CORP (JP) 2007-02-21 CN claimed
US-20040204543-A1 Controllable and rapid solubility rate of water-soluble polymeric films YANG THOMAS P (CA) 2004-10-14 US claimed
EP-0432585-B1 A detergent resin composition CHISSO CORP (JP) 1997-02-12 EP claimed
US-5108645-A Styrene homo-or copolymer, polymethyl methacrylate, neutral salt of a sulfonic acid and basic compound in specific proportions; for molding machines CHISSO CORPORATION (JP) 1992-04-28 US claimed
EP-0432585-A2 A detergent resin composition CHISSO CORPORATION (JP) 1991-06-19 EP claimed
JP-11228378-A None JP disclosed
US-11986546-B2 Dextrin fatty acid ester and cosmetic CHIBA FLOUR MILLING CO., LTD. (JP) 2024-05-21 US disclosed
WO-2024075371-A1 METHOD FOR SEPARATING/RECOVERING BASE artience株式会社 2024-04-11 WO disclosed
EP-4328290-A1 PRODUCTION METHOD FOR SOAP COMPOSITION CONTAINING SODIUM OF HIGHER FATTY ACID AND POTASSIUM OF HIGHER FATTY ACID SPH Corporation (JP) 2024-02-28 EP disclosed
WO-2024024724-A1 METHOD FOR SEPARATING/RECOVERING BASE artience株式会社 2024-02-01 WO disclosed
US-5108645-A Styrene homo-or copolymer, polymethyl methacrylate, neutral salt of a sulfonic acid and basic compound in specific proportions; for molding machines CHISSO CORPORATION (JP) 1992-04-28 US disclosed
CN-1053796-A Produce the method for absorbent resin SEITETSU KAGAKU CO LTD (JP) 1991-08-14 CN disclosed
EP-0432585-A2 A detergent resin composition CHISSO CORPORATION (JP) 1991-06-19 EP disclosed
EP-0422683-A1 Washing-off agent composition for dyed cellulose fiber articles NIHON SURFACTANT KOGYO K.K. (JP) 1991-04-17 EP disclosed
US-4894324-A WATER SOLUBLE SULFATES OF HETEROCYCLIC SULFATES AGFA-GEVAERT AKTIENGESSELLSCHAFT (DE) 1990-01-16 US disclosed
EP-0336265-A2 Hair cosmetic composition AJINOMOTO CO., INC. (JP) 1989-10-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11986546-B2 Dextrin fatty acid ester and cosmetic SCD, SCD5, GYPA LTA4H 1043/4885LSS 256/4885PYCR1 4107/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.