⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17439428 | 0.79 | — | — | |
| SCHEMBL17439415 | 0.79 | — | — | |
| SCHEMBL6389637 | 0.77 | — | — | |
| SCHEMBL3406419 | 0.76 | — | — | |
| SCHEMBL297046 | 0.76 | — | — | |
| SCHEMBL17001480 | 0.72 | — | — | |
| SCHEMBL23701300 | 0.69 | — | — | |
| SCHEMBL297263 | 0.69 | ALDH1A1 (0.39) | — | |
| SCHEMBL22264583 | 0.69 | ALDH1A1 (0.39) | — | |
| SCHEMBL384173 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250026962-A1 | COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME | SOULBRAIN CO., LTD. (KR) | 2025-01-23 | — | — | US | disclosed |
| US-12163058-B2 | Semiconductor element | SOULBRAIN CO., LTD. (KR) | 2024-12-10 | — | — | US | disclosed |
| US-12146076-B2 | Semiconductor element | SOULBRAIN CO., LTD. (KR) | 2024-11-19 | — | — | US | disclosed |
| US-12012525-B2 | Composition for etching and manufacturing method of semiconductor device using the same | SOULBRAIN CO., LTD. (KR) | 2024-06-18 | — | — | US | disclosed |
| US-11912902-B2 | Composition for etching and manufacturing method of semiconductor device using the same | SOULBRAIN CO., LTD. (KR) | 2024-02-27 | — | — | US | disclosed |
| CN-117568038-A | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2024-02-20 | — | — | CN | disclosed |
| EP-3385353-B1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO LTD (KR) | 2023-12-13 | — | — | EP | disclosed |
| US-20230141924-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO., LTD. (KR) | 2023-05-11 | — | — | US | disclosed |
| US-20230136538-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO., LTD. (KR) | 2023-05-04 | — | — | US | disclosed |
| US-11634634-B2 | Composition for etching | SOULBRAIN CO., LTD. (KR) | 2023-04-25 | — | — | US | disclosed |
| US-20210054285-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO., LTD. (KR) | 2021-02-25 | — | — | US | disclosed |
| US-20210054237-A1 | COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME | SEONGNAM-SI, GYEONGGI-DO (KR) | 2021-02-25 | — | — | US | disclosed |
| US-20210054238-A1 | COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME | SOULBRAIN CO., LTD. (KR) | 2021-02-25 | — | — | US | disclosed |
| US-20210047564-A1 | COMPOSITION FOR ETCHING | SOULBRAIN CO., LTD. (KR) | 2021-02-18 | — | — | US | disclosed |
| US-20200263087-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO., LTD. (KR) | 2020-08-20 | — | — | US | disclosed |
| US-20190136090-A1 | COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME | SOULBRAIN CO., LTD. (KR) | 2019-05-09 | — | — | US | disclosed |
| EP-3385353-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | Soulbrain Co., Ltd. (KR) | 2018-10-10 | — | — | EP | disclosed |
| CN-108291132-A | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2018-07-17 | — | — | CN | disclosed |
| US-9868902-B2 | Composition for etching | SOULBRAIN CO., LTD. (KR) | 2018-01-16 | — | — | US | disclosed |
| US-20160017224-A1 | COMPOSITION FOR ETCHING | SOULBRAIN CO., LTD. (KR) | 2016-01-21 | — | — | US | disclosed |