SCHEMBL17460662

SCHEMBL17460662

CCC(C)(C)C(=O)Oc1cccc2c1C(=O)c1cccc(O)c1C2=O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 2/20 0.50
▸ EGFR P00533 1/20 0.49
▸ PIM1 P11309 1/20 0.49
▸ MEN1 O00255 3/20 0.47
▸ KMT2A Q03164 3/20 0.47
▸ ELANE P08246 7/20 0.45
▸ ALDH1A1 P00352 3/20 0.45
▸ MAPT P10636 3/20 0.45
▸ MAPK1 P28482 3/20 0.45
▸ TSHR P16473 2/20 0.45
▸ TDP1 Q9NUW8 2/20 0.45
▸ LMNA P02545 2/20 0.45
▸ HPGD P15428 2/20 0.45
▸ HTT P42858 2/20 0.45
▸ SMN1; SMN2 Q16637 2/20 0.45
▸ ALOX15 P16050 1/20 0.45
▸ MAOB P27338 1/20 0.45
▸ HSD17B10 Q99714 1/20 0.45
▸ STAT3 P40763 3/20 0.44
▸ CTSG P08311 4/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17460665 0.89 ELANE (0.50) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL17460661 0.84 MAPT (0.50) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL25454477 0.80 ALDH1A1 (0.44) EGFRELANEALDH1A1MAPTMAPK1
SCHEMBL13212295 0.78 ELANE (0.45) KMT2AELANEALDH1A1MAPTMAPK1
SCHEMBL6365817 0.78 ELANE (0.53) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL15395810 0.77 CA12 (0.41) MEN1KMT2AELANEALDH1A1MAPT
SCHEMBL92373 0.76 ESR1 (0.51) MEN1KMT2AELANEALDH1A1MAPT
SCHEMBL26355387 0.76 ELANE (0.37) MEN1KMT2AELANEALDH1A1MAPT
SCHEMBL16775529 0.75 THRB (0.49) MEN1KMT2AELANEALDH1A1MAPT
SCHEMBL15113870 0.75 ELANE (0.36) KMT2AELANEALDH1A1MAPTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9244350-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-26 — — US disclosed
Send feedback