SCHEMBL26355387

SCHEMBL26355387

CCC(C)(C)C(=O)Oc1cccc(O)c1I

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 3/20 0.37
▸ MAPT P10636 3/20 0.37
▸ MAPK1 P28482 2/20 0.37
▸ GAA P10253 2/20 0.37
▸ CA12 O43570 2/20 0.37
▸ CA1 P00915 2/20 0.37
▸ CA2 P00918 2/20 0.37
▸ CA7 P43166 2/20 0.37
▸ CA9 Q16790 2/20 0.37
▸ CA14 Q9ULX7 2/20 0.37
▸ LMNA P02545 2/20 0.35
▸ POLB P06746 1/20 0.35
▸ ALOX15 P16050 2/20 0.33
▸ HSD17B10 Q99714 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ TP53 P04637 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ ALOX12 P18054 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25454477 0.86 ALDH1A1 (0.44) ELANEMAPTMAPK1CA12CA1
SCHEMBL13212295 0.84 ELANE (0.45) ELANEMAPTMAPK1GAACA1
SCHEMBL15395810 0.83 CA12 (0.41) ELANEMAPTMAPK1CA12CA1
SCHEMBL92373 0.82 ESR1 (0.51) ELANEMAPTMAPK1GAACA12
SCHEMBL15113870 0.81 ELANE (0.36) ELANEMAPTGAACA12CA1
SCHEMBL16775529 0.81 THRB (0.49) ELANEMAPTCA12CA1CA2
SCHEMBL25468121 0.80 ELANE (0.44) ELANEGAAKDM4EALDH1A1RIPK1
SCHEMBL25454482 0.79 CA1 (0.42) ELANEMAPTCA12CA1CA2
SCHEMBL16775535 0.78 CA12 (0.56) CA12CA1CA2CA7CA9
SCHEMBL10876865 0.78 CA12 (0.41) ELANEMAPTMAPK1GAACA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern RER1, AFF1, AFF4 ELANE 2166/4885MAPT 3833/4885MAPK1 3123/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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