SCHEMBL17522502

SCHEMBL17522502

CC(C)C(=O)OCC1CSC(=O)O1

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.30
KDM4E B2RXH2 1/20 0.30
PSMB5 P28074 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22252725 0.83 NLRP3 (0.40) ALDH1A1
SCHEMBL22658013 0.83 ALDH1A1 (0.30) ALDH1A1
SCHEMBL17522500 0.83
SCHEMBL22336953 0.81 ALDH1A1 (0.34) ALDH1A1
SCHEMBL23899292 0.79 PRKCA (0.33) ALDH1A1KDM4E
SCHEMBL20306539 0.79
SCHEMBL9610631 0.78 ALDH1A1 (0.57) ALDH1A1
SCHEMBL22703689 0.78 BACE1 (0.32)
SCHEMBL21784467 0.76 TSHR (0.34) ALDH1A1
SCHEMBL24611639 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10007178-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-20160048076-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-18 US disclosed
US-20160048076-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-18 US disclosed