SCHEMBL17539196

SCHEMBL17539196

C=C(C)C(=O)OC1CC(C(F)(F)F)C(C(F)(F)F)C1

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.37
▸ TSHR P16473 1/20 0.31
▸ KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17532383 0.92 ALDH1A1 (0.31) ALDH1A1
SCHEMBL17539197 0.85 GPR35 (0.36) ALDH1A1
SCHEMBL17532393 0.85 ALDH1A1 (0.34) ALDH1A1
SCHEMBL687414 0.83 ALDH1A1 (0.46) ALDH1A1TSHRKMT2A
SCHEMBL18479630 0.82 — —
SCHEMBL17742658 0.81 ALDH1A1 (0.34) ALDH1A1
SCHEMBL14121333 0.81 — —
SCHEMBL17532374 0.80 ALDH1A1 (0.31) ALDH1A1
SCHEMBL17532388 0.80 GPR35 (0.33) ALDH1A1
SCHEMBL17539210 0.79 ALDH1A1 (0.32) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9562122-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-07 — — US disclosed
US-20160053032-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160053032-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, RFC1, RFC2 ALDH1A1 1147/4885TSHR 2134/4885KMT2A 1085/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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