SCHEMBL17540318

SCHEMBL17540318

CCC(C)c1ccc(S(=O)(=O)NCC(F)(F)C(=O)OC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 3/20 0.42
▸ MAPT P10636 1/20 0.42
▸ HTT P42858 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ CA1 P00915 6/20 0.42
▸ CA2 P00918 6/20 0.42
▸ CA12 O43570 4/20 0.42
▸ CA9 Q16790 4/20 0.42
▸ MEN1 O00255 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ ALDH1A1 P00352 6/20 0.40
▸ CYP3A4 P08684 1/20 0.40
▸ CYP2C9 P11712 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ CYP2C19 P33261 1/20 0.40
▸ LMNA P02545 2/20 0.39
▸ TSHR P16473 2/20 0.39
▸ OPRK1 P41145 1/20 0.39
▸ KDM4E B2RXH2 2/20 0.38
▸ NPC1 O15118 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17540316 0.78 CA1 (0.43) SMN1; SMN2MAPTHTTHSD17B10CA1
SCHEMBL13138375 0.78 ALDH1A1 (0.49) CA1CA2CA12CA9MEN1
SCHEMBL17540319 0.77 NPSR1 (0.37) SMN1; SMN2MAPTCA1CA2CA12
SCHEMBL13508608 0.74 CA1 (0.50) SMN1; SMN2CA1CA2CA12CA9
SCHEMBL12646343 0.72 CA1 (0.47) CA1CA2CA12CA9MEN1
SCHEMBL8388722 0.71 CA12 (0.62) SMN1; SMN2MAPTHTTCA1CA2
SCHEMBL26420451 0.71 MEN1 (0.47) HSD17B10CA1CA2CA12CA9
SCHEMBL17880004 0.71 GRIA4 (0.42) CA1CA2MEN1KMT2AALDH1A1
SCHEMBL13656126 0.70 SMN1; SMN2 (0.57) SMN1; SMN2MEN1KMT2AALDH1A1TSHR
SCHEMBL10181243 0.70 PTPRZ1 (0.44) SMN1; SMN2HTTHSD17B10MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9599897-B2 Salt, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-03-21 — — US disclosed
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, AFF1, FRG1 SMN1; SMN2 992/4885MAPT 4477/4885HTT 1209/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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