SCHEMBL17557776

SCHEMBL17557776

Cc1cc(-c2cc(C=O)cc(-c3cc(C)c(O)cc3C)c2C)c(C)cc1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.43
▸ KDM4E B2RXH2 3/20 0.43
▸ MAPT P10636 3/20 0.43
▸ CYP3A4 P08684 2/20 0.43
▸ HPGD P15428 2/20 0.43
▸ G6PD P11413 2/20 0.43
▸ MAPK1 P28482 2/20 0.43
▸ CYP1A2 P05177 1/20 0.43
▸ CYP2D6 P10635 1/20 0.43
▸ CYP2C9 P11712 1/20 0.43
▸ PKM P14618 1/20 0.43
▸ ALOX15 P16050 1/20 0.43
▸ ALOX12 P18054 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43
▸ CCR6 P51684 1/20 0.43
▸ HIF1A Q16665 1/20 0.43
▸ NPSR1 Q6W5P4 1/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ SRC P12931 1/20 0.36
▸ PTGS2 P35354 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4388616 0.77 KDM4E (0.68) ALDH1A1KDM4EMAPTCYP3A4HPGD
SCHEMBL30693660 0.77 KDM4E (0.68) ALDH1A1KDM4EMAPTCYP3A4HPGD
Sulfur Dioxide SCHEMBL20677348 0.73 KDM4E (0.56) ALDH1A1KDM4EMAPTCYP3A4HPGD
SCHEMBL17557803 0.73 ERN1 (0.42) ALDH1A1KDM4EMAPTCYP3A4CYP1A2
SCHEMBL17557763 0.73 SELL (0.45) ALDH1A1KDM4EMAPTCYP3A4MAPK1
SCHEMBL17557780 0.73 CNR2 (0.43) ALDH1A1KDM4EMAPTHPGDALOX15
SCHEMBL13139867 0.73 ALDH1A1 (0.42) ALDH1A1KDM4EMAPTCYP3A4HPGD
SCHEMBL17557795 0.72 CA1 (0.48) CYP3A4CYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL31545845 0.71 ALDH1A1 (0.75) ALDH1A1KDM4EMAPTCYP3A4HPGD
SCHEMBL3468910 0.71 KDM4E (0.52) ALDH1A1KDM4ECYP3A4HPGDSRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10017664-B2 Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-07-10 — — US disclosed
US-20160068709-A1 NOVOLAC RESIN-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION USING BISPHENOL ALDEHYDE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-03-10 — — US disclosed
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