SCHEMBL17557795

SCHEMBL17557795

Cc1cc(-c2cc(C=O)cc(-c3cc(C)c(O)c(C)c3)c2C)cc(C)c1O

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 1/20 0.48
▸ CA2 P00918 1/20 0.48
▸ CYP2C9 P11712 3/20 0.40
▸ CYP1A2 P05177 2/20 0.40
▸ CYP3A4 P08684 1/20 0.40
▸ CYP2D6 P10635 1/20 0.40
▸ CYP2B6 P20813 1/20 0.40
▸ SRC P12931 2/20 0.38
▸ EEF2K O00418 1/20 0.38
▸ ERN1 O75460 1/20 0.36
▸ PTGS1 P23219 5/20 0.36
▸ PTGS2 P35354 5/20 0.36
▸ ALOX5 P09917 5/20 0.36
▸ TTR P02766 1/20 0.36
▸ CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL143965 0.81 CYP2C9 (0.56) CA1CA2CYP2C9CYP1A2CYP3A4
SCHEMBL17557803 0.78 ERN1 (0.42) CYP2C9CYP1A2CYP3A4CYP2D6CYP2B6
SCHEMBL19100600 0.74 CA1 (0.56) CA1CA2CYP2C9CYP1A2CYP3A4
SCHEMBL28047343 0.73 CA1 (0.48) CA1CA2CYP2C9CYP1A2CYP3A4
SCHEMBL3752346 0.73 CA1 (0.59) CA1CA2CYP2C9CYP1A2CYP3A4
SCHEMBL17557776 0.72 ALDH1A1 (0.43) CYP2C9CYP1A2CYP3A4CYP2D6SRC
SCHEMBL28047266 0.72 CA1 (0.46) CA1CA2CYP2C9CYP1A2CYP3A4
Glycine SCHEMBL8214592 0.72 CYP2C9 (0.47) CYP2C9CYP1A2CYP3A4CYP2D6CYP2B6
SCHEMBL299751 0.71 EGFR (0.53) CYP2C9CYP1A2CYP3A4CYP2D6CYP2B6
SCHEMBL29459683 0.71 EGFR (0.53) CYP2C9CYP1A2CYP3A4CYP2D6CYP2B6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10017664-B2 Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-07-10 — — US disclosed
US-20160068709-A1 NOVOLAC RESIN-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION USING BISPHENOL ALDEHYDE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-03-10 — — US disclosed
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