SCHEMBL4388616

SCHEMBL4388616

Cc1cc(-c2cc(C)c(O)cc2C)c(C)cc1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.68
MAPT P10636 3/20 0.68
G6PD P11413 2/20 0.68
MAPK1 P28482 2/20 0.68
ALDH1A1 P00352 1/20 0.68
CYP1A2 P05177 1/20 0.68
CYP3A4 P08684 1/20 0.68
CYP2D6 P10635 1/20 0.68
CYP2C9 P11712 1/20 0.68
PKM P14618 1/20 0.68
HPGD P15428 1/20 0.68
ALOX15 P16050 1/20 0.68
ALOX12 P18054 1/20 0.68
CYP2C19 P33261 1/20 0.68
CCR6 P51684 1/20 0.68
HIF1A Q16665 1/20 0.68
NPSR1 Q6W5P4 1/20 0.68
HSD17B10 Q99714 1/20 0.68
GAA P10253 2/20 0.48
TP53 P04637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30693660 1.00 KDM4E (0.68) KDM4EMAPTG6PDMAPK1ALDH1A1
SCHEMBL31545845 0.92 ALDH1A1 (0.75) KDM4EMAPTG6PDMAPK1ALDH1A1
Sulfur Dioxide SCHEMBL20677348 0.89 KDM4E (0.56) KDM4EMAPTG6PDMAPK1ALDH1A1
SCHEMBL19765514 0.88 KDM4E (0.68) KDM4EMAPTG6PDMAPK1ALDH1A1
SCHEMBL70123 0.87 MAPT (0.75) KDM4EMAPTG6PDMAPK1ALDH1A1
P-Cresol SCHEMBL15511594 0.83 ACHE (0.56) KDM4EMAPTG6PDMAPK1ALDH1A1
SCHEMBL16122277 0.83 ALDH1A1 (0.56) KDM4EMAPTG6PDMAPK1ALDH1A1
SCHEMBL15511832 0.83 KDM4E (0.56) KDM4EMAPTG6PDMAPK1ALDH1A1
Orthocresol SCHEMBL15512299 0.83 MAPT (0.56) KDM4EMAPTG6PDMAPK1ALDH1A1
SCHEMBL26437128 0.82 ALDH1A1 (0.79) KDM4EMAPTG6PDMAPK1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008036454-A1 POLY (ARYLENE ETHER) COPOLYMER SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2008-03-27 WO claimed
US-20080076885-A1 POLY(ARYLENE ETHER) COMPOSITION AND METHOD CITIBANK, N.A., AS COLLATERAL AGENT 2008-03-27 US claimed
US-20080076884-A1 POLY(ARYLENE ETHER) COMPOSITION AND METHOD CITIBANK, N.A., AS COLLATERAL AGENT 2008-03-27 US claimed
WO-2025224624-A1 CURABLE COMPOSITION AND CURED COMPOSITIONS DERIVED THEREFROM SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-10-30 WO disclosed
WO-2025224628-A1 POLYFUNCTIONAL POLY(ARYLENE ETHERS) AND CURABLE COMPOSITIONS THEREOF SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-10-30 WO disclosed
WO-2025224623-A1 POLYFUNCTIONAL POLY(ARYLENE ETHERS) AND COPOLYMERS THEREOF SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-10-30 WO disclosed
WO-2025224622-A1 POLYFUNCTIONAL POLY(ARYLENE ETHER) AND METHOD FOR THE MANUFACTURE THEREOF SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-10-30 WO disclosed
US-12398088-B2 Method for producing aromatic bis ether compound HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2025-08-26 US disclosed
EP-3612583-B1 POLY(PHENYLENE ETHER) COPOLYMER PROCESS AND COMPOSITIONS SHPP GLOBAL TECH BV (NL) 2023-01-18 EP disclosed
US-20220324789-A1 METHOD FOR PRODUCING AROMATIC BIS ETHER COMPOUND HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2022-10-13 US disclosed
EP-4043428-A1 PRODUCTION METHOD FOR AROMATIC BISETHER COMPOUND Honshu Chemical Industry Co., Ltd. (JP) 2022-08-17 EP disclosed
WO-2020218134-A1 METHOD FOR PRODUCING TETRACARBOXYLIC ACID DIANHYDRIDE 本州化学工業株式会社 2020-10-29 WO disclosed
CN-110028652-A A kind of high purity epoxy resins and preparation method thereof containing biphenyl structural 上海华谊树脂有限公司 2019-07-19 CN disclosed
US-20180011402-A1 RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME TORAY INDUSTRIES, INC. (JP) 2018-01-11 US disclosed
US-9023974-B2 Ester group-containing tetracarboxylic acid dianhydride, novel polyesterimide precursor derived therefrom, and polyesterimide HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2015-05-05 US disclosed
US-20090306329-A1 NOVEL ESTER GROUP-CONTAINING TETRACARBOXYLIC ACID DIANHYDRIDE, NOVEL POLYESTERIMIDE PRECURSOR DERIVED THEREFROM, AND POLYESTERIMIDE HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2009-12-10 US disclosed
US-20080085989-A1 POLY(ARYLENE ETHER) COPOLYMER CITIBANK, N.A., AS COLLATERAL AGENT 2008-04-10 US disclosed
US-20080076885-A1 POLY(ARYLENE ETHER) COMPOSITION AND METHOD CITIBANK, N.A., AS COLLATERAL AGENT 2008-03-27 US disclosed
US-20080076884-A1 POLY(ARYLENE ETHER) COMPOSITION AND METHOD CITIBANK, N.A., AS COLLATERAL AGENT 2008-03-27 US disclosed
WO-2008036454-A1 POLY (ARYLENE ETHER) COPOLYMER SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2008-03-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090306329-A1 NOVEL ESTER GROUP-CONTAINING TETRACARBOXYLIC ACID DIANHYDRIDE, NOVEL POLYESTERIMIDE PRECURSOR DERIVED THEREFROM, AND POLYESTERIMIDE NOTUM, WEE2, THEM6 KDM4E 1919/4885MAPT 3559/4885G6PD 4723/4885
US-20220324789-A1 METHOD FOR PRODUCING AROMATIC BIS ETHER COMPOUND PAH, CYP8B1, FHIT KDM4E 943/4885MAPT 1002/4885G6PD 2582/4885
US-20180011402-A1 RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME EED, RPL19, RARA KDM4E 1157/4885MAPT 960/4885G6PD 2260/4885
US-12398088-B2 Method for producing aromatic bis ether compound PAH, CYP8B1, FHIT KDM4E 943/4885MAPT 1002/4885G6PD 2582/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.