SCHEMBL17577433

SCHEMBL17577433

CCC(C)C(=O)Oc1ccc(C(=O)OCC(=O)OC(C)(C)C)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.49
MEN1 O00255 2/20 0.49
KMT2A Q03164 2/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
MAPT P10636 1/20 0.42
ELANE P08246 2/20 0.41
MAPK1 P28482 1/20 0.40
ALDH1A1 P00352 1/20 0.39
SLC22A2 O15244 1/20 0.38
TMPRSS2 O15393 1/20 0.38
F2 P00734 1/20 0.38
F10 P00742 1/20 0.38
PLG P00747 1/20 0.38
F12 P00748 1/20 0.38
PLAU P00749 1/20 0.38
PLAT P00750 1/20 0.38
KLKB1 P03952 1/20 0.38
CYP1A2 P05177 1/20 0.38
HPN P05981 1/20 0.38
CHRM2 P08172 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29319002 0.88 ELANE (0.46) GAAKMT2AL3MBTL1MAPTELANE
SCHEMBL14827264 0.85 PTPN1 (0.44) GAAMEN1KMT2AL3MBTL1MAPT
SCHEMBL12398855 0.80 KMT2A (0.46) GAAMEN1KMT2AL3MBTL1MAPT
SCHEMBL9880584 0.79 ELANE (0.57) GAAMEN1KMT2AL3MBTL1MAPT
SCHEMBL1856870 0.76 MAPK1 (0.66) GAAMEN1KMT2AL3MBTL1MAPT
SCHEMBL9880585 0.76 ELANE (0.42) GAAMEN1KMT2AL3MBTL1ELANE
SCHEMBL17853771 0.76 MAPT (0.41) GAAMEN1KMT2AMAPTELANE
SCHEMBL14119084 0.76 MEN1 (0.53) GAAMEN1KMT2AL3MBTL1MAPT
SCHEMBL15184084 0.75 CYP2D6 (0.36) GAAMEN1KMT2AL3MBTL1CYP1A2
SCHEMBL825605 0.75 ELANE (0.53) MEN1KMT2AL3MBTL1MAPTELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9523912-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound FUJIFILM CORPORATION (JP) 2016-12-20 US disclosed
US-20160070167-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2016-03-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160070167-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND RER1, TERB1, RXRA GAA 3505/4885MEN1 2880/4885KMT2A 2896/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.