Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR1B | P28222 | 2/20 | 0.40 |
| ▸ | CNR1 | P21554 | 5/20 | 0.39 |
| ▸ | CNR2 | P34972 | 5/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | HTR1D | P28221 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 2/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.36 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL9241514 | 0.89 | CNR1 (0.39) | HTR1BCNR1CNR2CYP2C9ALDH1A1 | |
| Hydrochloric Acid SCHEMBL9516769 | 0.89 | CNR1 (0.39) | HTR1BCNR1CNR2CYP2C9ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL112169 | 0.84 | KCNH2 (0.44) | CNR1CNR2CYP2C9GAATDP1 | |
| SCHEMBL700284 | 0.80 | CYP2A6 (0.43) | HTR1BCYP2C9ALDH1A1CYP2A6TDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL4624312 | 0.78 | KCNH2 (0.39) | CNR1CNR2CYP2C9GAATDP1 | |
| SCHEMBL12762160 | 0.75 | IDO1 (0.45) | ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564917 | 0.74 | KCNH2 (0.40) | — | |
| Phenanthrene SCHEMBL29016443 | 0.71 | ALDH1A1 (0.63) | HTR1BALDH1A1CYP2A6GAATDP1 | |
| SCHEMBL20245323 | 0.70 | HTR1B (0.43) | HTR1BHTR1DMEN1KMT2ASLC6A4 | |
| SCHEMBL4857402 | 0.69 | ALDH1A1 (0.40) | CYP2C9ALDH1A1CYP2A6TDP1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1637928-B1 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2012-05-02 | — | — | EP | claimed |
| EP-1736828-B1 | Photoresist monomer, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2010-11-24 | — | — | EP | claimed |
| US-6613493-B2 | Formed by nitrating a polyvinylphenol or a novalak and reacting the the hydroxy group with with a halide comprising an acid labile protecting group, such as 2-(1-bromoethyl)-1,3-difluorobenzene | HYNIX SEMICONDUCTOR INC (KR) | 2003-09-02 | — | — | US | claimed |
| US-6608158-B2 | High transparency at 193 nm wavelength, provides increased etching resistance; formed without 5-norbonen-2-carboxylate monomers which do not have offensive odors of the free acid | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2003-08-19 | — | — | US | claimed |
| US-20030013036-A1 | Photoresist polymer and composition having nitro groups | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-16 | — | — | US | claimed |
| US-20020068803-A1 | Copolymer resin, preparation thereof, and photoresist using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-06-06 | — | — | US | claimed |
| US-6265130-B1 | COPOLYMERS OF BICYCLOALKENECARBONYLMALONATES | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-07-24 | — | — | US | claimed |
| WO-2021065450-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |
| EP-3394675-A1 | MATERIALS CONTAINING METAL OXIDES, PROCESSES FOR MAKING SAME, AND PROCESSES FOR USING SAME | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2018-10-31 | — | — | EP | disclosed |
| WO-2017108822-A1 | MATERIALS CONTAINING METAL OXIDES, PROCESSES FOR MAKING SAME, AND PROCESSES FOR USING SAME | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2017-06-29 | — | — | WO | disclosed |
| US-9389515-B2 | Photoresist resin composition and method of forming patterns by using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-07-12 | — | — | US | disclosed |
| US-9321875-B2 | Additive for resist and resist composition comprising same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2016-04-26 | — | — | US | disclosed |
| US-20150212422-A1 | PHOTORESIST RESIN COMPOSITION AND METHOD OF FORMING PATTERNS BY USING THE SAME | SAMSUNG DISPLAY CO LTD (KR) | 2015-07-30 | — | — | US | disclosed |
| US-6312865-B1 | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-11-06 | — | — | US | disclosed |
| US-6248847-B1 | ACRYLATED ESTER | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-06-19 | — | — | US | disclosed |
| US-6146810-A | REGULATING THE CONTENT AND KIND OF THE NORBORNENE DERIVATIVES IN THE MATRIX POLYMERS IN ADDITION TO BEING SUPERIOR IN ADHERENCE TO SUBSTRATE AND DRY ETCH RESISTANCE | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2000-11-14 | — | — | US | disclosed |
| US-6132926-A | ArF photoresist copolymers | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-10-17 | — | — | US | disclosed |
| CN-1232826-A | Novel monomer and polymer for photoresist, and photoresist using the same | HYUNDAI ELECTRONICS IND (KR) | 1999-10-27 | — | — | CN | disclosed |
| CN-1228410-A | Copolymer resin, preparation thereof, and photo resist using the same | HYUNDAI ELECTRONICS IND (KR) | 1999-09-15 | — | — | CN | disclosed |
| CN-1221969-A | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | HYUNDAI ELECTRONICS IND (KR) | 1999-07-07 | — | — | CN | disclosed |