Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 7/20 | 0.44 |
| ▸ | GPR3 | P46089 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 5/20 | 0.34 |
| ▸ | CNR1 | P21554 | 4/20 | 0.34 |
| ▸ | CNR2 | P34972 | 4/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL4624312 | 0.93 | KCNH2 (0.39) | KCNH2GPR3GAATDP1L3MBTL1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564917 | 0.92 | KCNH2 (0.40) | KCNH2GPR3ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL646691 | 0.86 | KCNH2 (0.39) | KCNH2GPR3ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31168264 | 0.86 | KCNH2 (0.39) | KCNH2GPR3ACHE | |
| SCHEMBL1758997 | 0.84 | HTR1B (0.40) | GAATDP1L3MBTL1CNR1CNR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL31168285 | 0.79 | GPR3 (0.40) | KCNH2GPR3ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL645454 | 0.79 | GPR3 (0.40) | KCNH2GPR3ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31235599 | 0.78 | GPR3 (0.42) | KCNH2GPR3ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL66197 | 0.78 | GPR3 (0.42) | KCNH2GPR3ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL7708065 | 0.77 | GPR3 (0.35) | KCNH2GPR3ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 772 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| EP-1637928-B1 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2012-05-02 | — | — | EP | claimed |
| US-8029970-B2 | Composition for manufacturing barrier rib, and plasma display panel manufactured by the same | SAMSUNG SDI CO., LTD. (KR) | 2011-10-04 | — | — | US | claimed |
| US-7994050-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2011-08-09 | — | — | US | claimed |
| US-20100311239-A1 | Method for forming dual damascene pattern | LEE KI LYOUNG | 2010-12-09 | — | — | US | claimed |
| EP-1736828-B1 | Photoresist monomer, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2010-11-24 | — | — | EP | claimed |
| US-7811929-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR, INC. (KR) | 2010-10-12 | — | — | US | claimed |
| US-7749680-B2 | Photoresist composition and method for forming pattern of a semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2010-07-06 | — | — | US | claimed |
| US-7611823-B1 | Photosensitive polymeric material for WORM optical data storage with two-photon fluorescent readout | UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC. (US) | 2009-11-03 | — | — | US | claimed |
| US-7598018-B1 | Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout | UNIVERSITY OF CENTRAL FLORIDA RESEARCH FOUNDATION, INC. (US) | 2009-10-06 | — | — | US | claimed |
| CN-1318773-A | Photoresist composition for etch-resistant agent flowing process and method for forming contact hole using the same | HYUNDAI ELECTRONICS IND (KR) | 2001-10-24 | — | — | CN | claimed |
| US-20010031420-A1 | Partially crosslinked polymer for bilayer photoresist | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-10-18 | — | — | US | claimed |
| US-6291131-B1 | ADDITION POLYMERIZATION OF MONOMERS TO FORM PHOTORESISTS COPOLYMER | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-09-18 | — | — | US | claimed |
| US-6235448-B1 | EXPOSURE TO LIGHT SOURCE; DEVELOPMENT; SEMICONDUCTORS | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-22 | — | — | US | claimed |
| US-6235447-B1 | FORMING PATTERN; SEMICONDUCTOR | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-22 | — | — | US | claimed |
| US-6225020-B1 | SUCH AS USED IN 4 G OR 16 G DRAM SEMICONDUCTOR DEVICES USING A LIGHT SOURCE SUCH AS ARF, AN E-BEAM, EUV, OR AN ION BEAM, PHOTORESIST FOR THE TOP SURFACE IMAGE (TSI) PROCESS USING SILYLATION, MALEIMIDE ANDNORBONENE CARBOXYLATE COMONOMERS, | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-01 | — | — | US | claimed |
| US-6165672-A | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-12-26 | — | — | US | claimed |
| US-6132926-A | ArF photoresist copolymers | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-10-17 | — | — | US | claimed |
| US-6132936-A | Monomer and polymer for photoresist, and photoresist using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-10-17 | — | — | US | claimed |
| US-6063542-A | Polymer for positive photoresist and chemical amplification positive photoresist composition comprising the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2000-05-16 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20010031420-A1 | Partially crosslinked polymer for bilayer photoresist | LCP1, ARPC4, PARP14 | KCNH2 2684/4885GPR3 1231/4885GAA 4688/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.