SCHEMBL17599141

SCHEMBL17599141

CCC(O)CCC(CC)CO

nearest known ligand 0.54

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.54
LMNA P02545 3/20 0.37
THRB P10828 1/20 0.33
TRPA1 O75762 1/20 0.32
TSHR P16473 3/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5883915 0.86 TSHR (0.37) ALDH1A1TSHRTDP1
SCHEMBL2380019 0.86 ALDH1A1 (0.68) ALDH1A1LMNATRPA1TSHRTDP1
SCHEMBL11444402 0.85 ALDH1A1 (0.56) ALDH1A1LMNATHRBTRPA1TSHR
SCHEMBL11124823 0.85 LMNA (0.44) ALDH1A1LMNATHRBTSHR
SCHEMBL29023675 0.81 ALDH1A1 (0.52) ALDH1A1LMNATRPA1TSHR
SCHEMBL13677485 0.81 THRB (0.48) ALDH1A1LMNATHRBTSHRTDP1
SCHEMBL11040683 0.80 THRB (0.53) ALDH1A1LMNATHRBTSHRTDP1
SCHEMBL19738979 0.80 THRB (0.53) ALDH1A1LMNATHRBTSHRTDP1
SCHEMBL4885201 0.80 ALDH1A1 (0.45) ALDH1A1LMNATRPA1TSHRTDP1
SCHEMBL619867 0.80 TSHR (0.47) ALDH1A1LMNATHRBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113490721-B Modified copolyester resin and aqueous dispersion thereof 东洋纺MC株式会社 2024-01-16 CN claimed
US-12378404-B2 Modified copolymerized polyester resin and water dispersion thereof TOYOBO MC CORPORATION (JP) 2025-08-05 US disclosed
EP-3875539-B1 MODIFIED COPOLYMERIZED POLYESTER RESIN AND WATER DISPERSION THEREOF TOYOBO MC CORP (JP) 2025-07-16 EP disclosed
CN-113490721-B Modified copolyester resin and aqueous dispersion thereof 东洋纺MC株式会社 2024-01-16 CN disclosed
WO-2022071219-A1 WATER-BASED DISPERSION OF GRAFT-MODIFIED BIODEGRADABLE POLYESTER RESIN 東洋紡株式会社 2022-04-07 WO disclosed
US-20220106481-A1 MODIFIED COPOLYMERIZED POLYESTER RESIN AND WATER DISPERSION THEREOF TOYOBO CO., LTD. (JP) 2022-04-07 US disclosed
CN-113490721-A Modified copolyester resin and aqueous dispersion thereof 东洋纺株式会社 2021-10-08 CN disclosed
EP-3875539-A1 MODIFIED COPOLYMER POLYESTER RESIN AND AQUEOUS DISPERSION THEREOF TOYOBO CO., LTD. (JP) 2021-09-08 EP disclosed
WO-2020230692-A1 MODIFIED COPOLYMER POLYESTER RESIN AND AQUEOUS DISPERSION THEREOF 東洋紡株式会社 2020-11-19 WO disclosed
CN-105209170-B Solid phosphoric acid catalyst and the manufacture method using its trioxane 日商科莱恩触媒股份有限公司 2018-04-03 CN disclosed
US-9409159-B2 Solid phosphoric acid catalyst, and method for producing trioxane CLARIANT CATALYSTS (JAPAN) K.K. (JP) 2016-08-09 US disclosed
US-20160089661-A1 SOLID PHOSPHORIC ACID CATALYST, AND METHOD FOR PRODUCING TRIOXANE CLARIANT CATALYSTS (JAPAN) K.K. (JP) 2016-03-31 US disclosed
EP-2998023-A1 SOLID PHOSPHORIC ACID CATALYST, AND METHOD FOR PRODUCING TRIOXANE Clariant Catalysts (Japan) K.K. (JP) 2016-03-23 EP disclosed
CN-103339094-A Method for producing hemiformal concentrate and method for producing formaldehyde gas POLYPLASTICS CO 2013-10-02 CN disclosed
CN-1261513-C Pressure-sensitive adhesive curable with active energy beam and pressure-sensitive adhesive sheet TOAGOSEI CO LTD (JP) 2006-06-28 CN disclosed
CN-1639289-A Pressure-sensitive adhesive curable with active energy ray and pressure-sensitive adhesive sheet TOAGOSEI CO LTD (JP) 2005-07-13 CN disclosed