SCHEMBL1770488

SCHEMBL1770488

CCO[SiH2]CCCNC(N)=O

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
ACHE P22303 5/20 0.32
EPHX1 P07099 3/20 0.32
EGLN1 Q9GZT9 1/20 0.32
GRIN2D O15399 1/20 0.32
GRIN3B O60391 1/20 0.32
GRIN1 Q05586 1/20 0.32
GRIN2A Q12879 1/20 0.32
GRIN2B Q13224 1/20 0.32
GRIN2C Q14957 1/20 0.32
GRIN3A Q8TCU5 1/20 0.32
SIGMAR1 Q99720 1/20 0.32
ALOX15 P16050 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8279407 0.83 KDM4E (0.50) CA12CA1CA2CA9MEN1
SCHEMBL28273620 0.83 EGLN1 (0.40) CA12CA1CA2CA9MEN1
SCHEMBL21804924 0.82 HDAC3 (0.31)
SCHEMBL17286268 0.81 EPHX1 (0.53) CA12CA1CA2CA9ACHE
SCHEMBL1897574 0.81 EPHX1 (0.34) MEN1KMT2AACHEEPHX1TSHR
SCHEMBL20592353 0.80 EPHX1 (0.34) CA12CA1CA2CA9EPHX1
SCHEMBL15629698 0.80 ACHE (0.47) KMT2AACHEEPHX1
SCHEMBL28483594 0.80 TSHR (0.42) TSHR
SCHEMBL16430501 0.79
SCHEMBL3142448 0.78 TSHR (0.31) CA12CA1CA2CA9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-10152632-A None JP disclosed
JP-2228365-A None JP disclosed
CN-110028666-B Polyimide precursor and resin composition containing same 旭化成株式会社 2021-11-09 CN disclosed
CN-111808420-B Resin precursor, resin composition containing the same, polyimide resin film, and method for producing the same 旭化成株式会社 2021-09-28 CN disclosed
CN-111808420-A Resin precursor, resin composition containing the same, polyimide resin film, and method for producing the same 旭化成株式会社 2020-10-23 CN disclosed
CN-106661326-B Resin precursor, resin composition containing the same, polyimide resin film, and method for producing the same 旭化成株式会社 2020-04-21 CN disclosed
CN-105659154-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2019-04-12 CN disclosed
CN-103242713-B Composition for inkjet and recording material 精工爱普生株式会社 2017-04-12 CN disclosed
CN-104541204-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing touch panel HITACHI CHEMICAL CO LTD 2015-04-22 CN disclosed
US-20110111233-A1 INORGANIC NANOPARTICLE LABELING AGENT KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2011-05-12 US disclosed
US-20070231610-A1 Magnetic recording medium FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070176304-A1 Regularly-aligned nano-structured material and method for producing the same FUJIFILM CORPORATION (JP) 2007-08-02 US disclosed
JP-H10152632-A COATING MATERIAL HAVING IMPROVED PRINTABILITY AND GLASS SUBSTRATE COATED THEREWITH MITSUBOSHI BELTING LTD 1998-06-09 JP disclosed
EP-0513368-A1 FROSTING AGENT FOR WATER-BASED POLYURETHANE AND PRODUCTION THEREOF MOON-STAR CHEMICAL CORPORATION (JP) 1992-11-19 EP disclosed
JP-H02228365-A TWO-COMPONENT HARDENABLE COMPOSITION WITH IMPROVED STORAGE STABILITY KANEGAFUCHI CHEM IND CO LTD 1990-09-11 JP disclosed
EP-0342788-A1 Synthetic resin composition Bridgestone Corporation (JP) 1989-11-23 EP disclosed