SCHEMBL17711071

SCHEMBL17711071

C[SiH2]CC[SiH2]NC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17711126 0.84
SCHEMBL8720892 0.67
SCHEMBL11736858 0.61
SCHEMBL17711079 0.61
SCHEMBL234611 0.60
SCHEMBL17711118 0.58 ALDH1A1 (0.31)
SCHEMBL17711076 0.58
SCHEMBL49636 0.57
SCHEMBL25168625 0.57 ALOX15 (0.30)
SCHEMBL2268642 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10422034-B2 Silicon-based films and methods of forming the same VERSUM MATERIALS US, LLC (US) 2019-09-24 US claimed
US-9879340-B2 Silicon-based films and methods of forming the same VERSUM MATERIALS US, LLC (US) 2018-01-30 US claimed
EP-3023514-B1 SILICON-BASED FILMS AND METHODS OF FORMING THE SAME VERSUM MAT US LLC (US) 2023-10-25 EP disclosed
US-10422034-B2 Silicon-based films and methods of forming the same VERSUM MATERIALS US, LLC (US) 2019-09-24 US disclosed
US-20180119276-A1 Silicon-Based Films and Methods of Forming the Same VERSUM MATERIALS US, LLC (US) 2018-05-03 US disclosed
US-20180119276-A1 Silicon-Based Films and Methods of Forming the Same VERSUM MATERIALS US, LLC (US) 2018-05-03 US disclosed
US-9879340-B2 Silicon-based films and methods of forming the same VERSUM MATERIALS US, LLC (US) 2018-01-30 US disclosed
US-9879340-B2 Silicon-based films and methods of forming the same VERSUM MATERIALS US, LLC (US) 2018-01-30 US disclosed
EP-3023514-A1 SILICON-BASED FILMS AND METHODS OF FORMING THE SAME AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-05-25 EP disclosed
EP-3023514-A1 SILICON-BASED FILMS AND METHODS OF FORMING THE SAME AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-05-25 EP disclosed
CN-105568249-A Silicon-based thin film and method of forming the same AIR PROD & CHEM 2016-05-11 CN disclosed
US-20160122869-A1 SILICON-BASED FILMS AND METHODS OF FORMING THE SAME AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-05-05 US disclosed
US-20160122869-A1 SILICON-BASED FILMS AND METHODS OF FORMING THE SAME AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-05-05 US disclosed