SCHEMBL1773558

SCHEMBL1773558

C=C(C)C(=O)OC([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.44

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
TSHR P16473 3/20 0.40
THRB P10828 1/20 0.33
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL145421 0.84 TSHR (0.43) ALDH1A1TSHRTHRBTDP1
SCHEMBL10719831 0.81 ALDH1A1 (0.44) ALDH1A1TSHRTHRBTDP1
SCHEMBL3886364 0.74 TSHR (0.43) ALDH1A1TSHRTHRBTDP1
SCHEMBL2562316 0.74 TSHR (0.39) ALDH1A1TSHRTHRB
SCHEMBL1677860 0.74 TSHR (0.39) ALDH1A1TSHRTHRB
SCHEMBL17070900 0.74 ALDH1A1 (0.52) ALDH1A1TSHRTHRBTDP1
SCHEMBL25329223 0.73 TSHR (0.42) ALDH1A1TSHRTHRB
SCHEMBL28899131 0.73 ALDH1A1 (0.41) ALDH1A1TSHRTHRB
SCHEMBL420702 0.73 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL15253 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111979365-B Soybean lecithin retanning fatting agent with mildew-proof performance and preparation method thereof 扬州工业职业技术学院 2022-06-14 CN disclosed
US-11021630-B2 Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2021-06-01 US disclosed
CN-111979365-A Soybean lecithin retanning fatting agent with mildew-proof performance and preparation method thereof 扬州工业职业技术学院 2020-11-24 CN disclosed
CN-106125503-B Copolymer formulations for directed self-assembly, methods of manufacture thereof, and articles comprising the same 陶氏环球技术有限公司 2020-01-10 CN disclosed
US-10351727-B2 Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same DOW GLOBAL TECHNOLOGIES LLC (US) 2019-07-16 US disclosed
US-10011713-B2 Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same DOW GLOBAL TECHNOLOGIES LLC (US) 2018-07-03 US disclosed
US-9916973-B2 Photolithographic methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-03-13 US disclosed
US-9765214-B2 Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2017-09-19 US disclosed
US-9738814-B2 Method of controlling block copolymer characteristics and articles manufactured therefrom DOW GLOBAL TECHNOLOGIES LLC (US) 2017-08-22 US disclosed
US-9735023-B2 Methods for manufacturing block copolymer compositions and articles manufactured therefrom DOW GLOBAL TECHNOLOGIES LLC (US) 2017-08-15 US disclosed
US-8574895-B2 Method and apparatus using optical techniques to measure analyte levels SANOFI-AVENTIS DEUTSCHLAND GMBH (DE) 2013-11-05 US disclosed
US-20120264204-A1 Method and apparatus using optical techniques to measure analyte levels SANOFI-AVENTIS DEUTSCHLAND GMBH (DE) 2012-10-18 US disclosed
US-20120135146-A1 METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES JSR CORPORATION (JP) 2012-05-31 US disclosed
US-20120135146-A1 METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES JSR CORPORATION (JP) 2012-05-31 US disclosed
US-20110111345-A1 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-05-12 US disclosed
US-20110111345-A1 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-05-12 US disclosed
WO-2011054572-A1 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-05-12 WO disclosed
US-6653048-B2 Radiation sensitive bilayer resists which are used in manufacture of integrated circuits INTERNATIONAL BUSINESS MACHINES CORP. 2003-11-25 US disclosed
US-20020127490-A1 High silicon content monomers and polymers suitable for 193 nm bilayer resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-09-12 US disclosed
US-6444408-B1 High silicon content monomers and polymers suitable for 193 nm bilayer resists INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-03 US disclosed