Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1772081 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1CYP1A2CYP2C9 | |
| SCHEMBL1772592 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1CYP1A2CYP2C9 | |
| SCHEMBL1773122 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1CYP1A2CYP2C9 | |
| SCHEMBL525839 | 0.97 | KDM4E (0.36) | KDM4ETSHRTDP1 | |
| SCHEMBL525110 | 0.88 | KDM4E (0.37) | KDM4ETSHRTDP1 | |
| Iodide SCHEMBL7635296 | 0.85 | KDM4E (0.36) | KDM4ETSHRTDP1 | |
| SCHEMBL5487202 | 0.84 | TSHR (0.42) | KDM4ETSHRTDP1CYP1A2CYP2C9 | |
| SCHEMBL1824897 | 0.84 | TSHR (0.42) | KDM4ETSHRTDP1CYP1A2CYP2C9 | |
| SCHEMBL1827978 | 0.84 | TSHR (0.42) | KDM4ETSHRTDP1CYP1A2CYP2C9 | |
| SCHEMBL5489726 | 0.84 | TSHR (0.42) | KDM4ETSHRTDP1CYP1A2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9029067-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20150004547-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20140363773-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8877429-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-20120244478-A1 | RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| US-8211624-B2 | Method for pattern formation and resin composition for use in the method | JSR CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20120156621-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| EP-2378362-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME | JSR Corporation (JP) | 2011-10-19 | — | — | EP | disclosed |
| US-20110223544-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME | JSR CORPORATION (JP) | 2011-09-15 | — | — | US | disclosed |
| US-20110123936-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110111349-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20100323292-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100190104-A1 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2128706-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR Corporation (JP) | 2009-12-02 | — | — | EP | disclosed |