SCHEMBL1773122

SCHEMBL1773122

CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.34

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.34
TSHR P16473 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CYP1A2 P05177 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1772081 1.00 KDM4E (0.34) KDM4ETSHRTDP1CYP1A2CYP2C9
SCHEMBL1773644 1.00 KDM4E (0.34) KDM4ETSHRTDP1CYP1A2CYP2C9
SCHEMBL1772592 1.00 KDM4E (0.34) KDM4ETSHRTDP1CYP1A2CYP2C9
SCHEMBL525839 0.97 KDM4E (0.36) KDM4ETSHRTDP1
SCHEMBL525110 0.88 KDM4E (0.37) KDM4ETSHRTDP1
Iodide SCHEMBL7635296 0.85 KDM4E (0.36) KDM4ETSHRTDP1
SCHEMBL5487202 0.84 TSHR (0.42) KDM4ETSHRTDP1CYP1A2CYP2C9
SCHEMBL1824897 0.84 TSHR (0.42) KDM4ETSHRTDP1CYP1A2CYP2C9
SCHEMBL1827978 0.84 TSHR (0.42) KDM4ETSHRTDP1CYP1A2CYP2C9
SCHEMBL5489726 0.84 TSHR (0.42) KDM4ETSHRTDP1CYP1A2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0077114-B1 PERFLUOROCHEMICALS, PROCESS FOR PREPARING THE SAME AND THEIR USE AS BLOOD SUBSTITUTES GREEN CROSS CORPORATION (JP) 1987-12-02 EP claimed
WO-2025057732-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AGC株式会社 2025-03-20 WO disclosed
WO-2025057733-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AGC株式会社 2025-03-20 WO disclosed
WO-2023111919-A1 OPTO-ELECTRONIC DEVICE COMPRISING A PATTERNING COATING COMPRISING A PLURALITY OF MATERIALS OTI LUMIONICS INC. (CA) 2023-06-22 WO disclosed
US-20230200214-A1 COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF DUK SAN NEOLUX CO., LTD. (KR) 2023-06-22 US disclosed
US-20230135489-A1 FLUORINE-CONTAINING COPOLYMER, COMPOSITION, OPTICAL FILM, LIQUID CRYSTAL FILM, HARDCOAT FILM, AND POLARIZING PLATE FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed
WO-2023282511-A1 COMPOUND FOR ORGANIC ELECTRIC ELEMENT, ORGANIC ELECTRIC ELEMENT USING SAME, AND ELECTRONIC DEVICE THEREOF 덕산네오룩스 주식회사 2023-01-12 WO disclosed
EP-3643728-B1 METHODS FOR PRODUCING FLUORINATED POLYMER, FLUORINATED POLYMER HAVING FUNCTIONAL GROUP AND ELECTROLYTE MEMBRANE AGC INC (JP) 2022-08-17 EP disclosed
CN-110785443-B Fluorine-containing polymer, fluorine-containing polymer having functional group, and method for producing electrolyte membrane AGC株式会社 2022-06-07 CN disclosed
EP-3320540-A1 NEW TRIAZINE AS PHOTO INITIATORS AND THEIR PREPARATION Covestro Deutschland AG (DE) 2018-05-16 EP disclosed
US-20120244478-A1 RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2012-09-27 US disclosed
US-8211624-B2 Method for pattern formation and resin composition for use in the method JSR CORPORATION (JP) 2012-07-03 US disclosed
US-20120156621-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-06-21 US disclosed
EP-2378362-A1 RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME JSR Corporation (JP) 2011-10-19 EP disclosed
US-20110223544-A1 RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME JSR CORPORATION (JP) 2011-09-15 US disclosed
US-20110123936-A1 RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2011-05-26 US disclosed
US-20110111349-A1 RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME JSR CORPORATION (JP) 2011-05-12 US disclosed
US-20100323292-A1 RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN JSR CORPORATION (JP) 2010-12-23 US disclosed
US-20100190104-A1 METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD JSR CORPORATION (JP) 2010-07-29 US disclosed
EP-2128706-A1 RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN JSR Corporation (JP) 2009-12-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230200214-A1 COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF EMC1, EMC2, EPCAM KDM4E 516/4885TSHR 3804/4885TDP1 3083/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.