Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17752187 | 0.83 | HSD11B1 (0.36) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| SCHEMBL17754068 | 0.81 | HSD11B1 (0.34) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| SCHEMBL418793 | 0.80 | HSD11B1 (0.44) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| SCHEMBL17752167 | 0.79 | ALDH1A1 (0.36) | HSD11B1 | |
| Ethane SCHEMBL27484858 | 0.79 | HSD11B1 (0.43) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| SCHEMBL17752193 | 0.76 | HSD11B1 (0.36) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| Methacrylic Acid SCHEMBL13504159 | 0.76 | HSD11B1 (0.41) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| SCHEMBL18994289 | 0.75 | HSD11B1 (0.46) | HSD11B1CYP2C9FKBP1AEPHX1EPHX2 | |
| SCHEMBL365664 | 0.74 | EPHX2 (0.38) | HSD11B1EPHX1EPHX2 | |
| SCHEMBL22186348 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | HSD11B1 563/4885CYP2C9 1848/4885FKBP1A 3034/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.