SCHEMBL17752194

SCHEMBL17752194

CCC(C)(C)C(=O)OC(C)(C)C(=O)OC1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.44
CYP19A1 P11511 2/20 0.42
NAAA Q02083 2/20 0.41
HTT P42858 3/20 0.36
CYP2C19 P33261 1/20 0.35
FKBP1A P62942 4/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
HMGCR P04035 1/20 0.34
CHRM3 P20309 2/20 0.32
KDM4E B2RXH2 1/20 0.32
CCR2 P41597 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3434643 0.88 EPHX1 (0.50) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL20388945 0.88 EPHX1 (0.50) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL131561 0.88 EPHX1 (0.50) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL108478 0.88 EPHX1 (0.50) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL132134 0.86 EPHX1 (0.47) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL3435204 0.83 EPHX1 (0.43) EPHX1CYP19A1NAAAHTTFKBP1A
SCHEMBL7061465 0.82 NAAA (0.45) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL23323285 0.81 CYP19A1 (0.44) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL4680192 0.80 NAAA (0.44) EPHX1CYP19A1NAAAHTTCYP2C19
SCHEMBL3709223 0.80 CYP19A1 (0.46) EPHX1CYP19A1NAAAHTTCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9971241-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-05-15 US disclosed
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN AFF1, AFF2, AFF4 EPHX1 923/4885CYP19A1 630/4885NAAA 3161/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.