SCHEMBL17805474

SCHEMBL17805474

C=C(C)C(=O)OC(C)C(C(=O)OC(C)(C)C)C1CCOC1=O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2680079 0.76 POLB (0.36) POLB
SCHEMBL17796883 0.75 POLB (0.33) POLB
SCHEMBL29995373 0.67 TSHR (0.42)
SCHEMBL1218503 0.66 POLB (0.43) POLB
SCHEMBL12649323 0.66 POLB (0.31) POLB
SCHEMBL24908878 0.66 FKBP1A (0.35) POLB
SCHEMBL7287157 0.65 ABCB1 (0.35)
SCHEMBL13779543 0.65 ALDH1A1 (0.41) POLB
SCHEMBL10219297 0.64 POLB (0.30) POLB
SCHEMBL28813853 0.64 GAA (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3029524-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND JSR Corporation (JP) 2016-06-08 EP disclosed