Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17805474 | 0.76 | POLB (0.30) | POLB | |
| SCHEMBL10115322 | 0.76 | POLB (0.38) | POLBALDH1A1MAPK1SMN1; SMN2KDM4E | |
| SCHEMBL1218503 | 0.76 | POLB (0.43) | POLBALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL8645514 | 0.75 | POLB (0.36) | POLBTSHRMAPK1SMN1; SMN2 | |
| SCHEMBL16782684 | 0.74 | TSHR (0.42) | ALDH1A1TSHR | |
| SCHEMBL15681498 | 0.74 | FKBP1A (0.40) | POLBALDH1A1KDM4E | |
| SCHEMBL23581803 | 0.73 | ALDH1A1 (0.40) | ALDH1A1TSHR | |
| SCHEMBL10135170 | 0.73 | POLB (0.33) | POLBALDH1A1TSHR | |
| SCHEMBL10219297 | 0.71 | POLB (0.30) | POLB | |
| SCHEMBL10064399 | 0.71 | TSHR (0.35) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | claimed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| US-20240092956-A1 | Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-03-21 | — | — | US | disclosed |
| US-11845822-B2 | Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-12-19 | — | — | US | disclosed |
| US-20220213243-A1 | Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-07-07 | — | — | US | disclosed |
| WO-2021132631-A1 | THERMALLY CURABLE HARDCOAT AGENT, LAYERED FILM, AND DECORATED MOLDED OBJECT | 東洋インキＳＣホールディングス株式会社 | 2021-07-01 | — | — | WO | disclosed |
| US-10336851-B2 | Copolymer for semiconductor lithography, resist composition, and method for manufacturing substrate | MITSUBISHI CHEMICAL CORPORATION | 2019-07-02 | — | — | US | disclosed |
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20040248031-A1 | 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1447403-A1 | 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS | Mitsubishi Rayon Co., Ltd. (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| US-6706826-B1 | COMONOMERS COMPRISING ALICYCLIC AND LACTONE STRUCTURES; HYDROPHOBIC AND HEAT RESISTANCE, SOLVENT SOLUBILITY; PAINTS | MITSUBISHI RAYON CO., LTD. (JP) | 2004-03-16 | — | — | US | disclosed |
| EP-1352904-A1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-15 | — | — | EP | disclosed |
| US-20030148214-A1 | Resins for resists and chemically amplifiable resist compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1304340-A1 | RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-04-23 | — | — | EP | disclosed |
| EP-1209525-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION | Mitsubishi Rayon Co., Ltd. (JP) | 2002-05-29 | — | — | EP | disclosed |
| EP-1074566-A1 | COPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION | Mitsubishi Rayon Co., Ltd. (JP) | 2001-02-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220213243-A1 | Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor | ASS1, SETDB1, MAT1A | POLB 1753/4885ALDH1A1 195/4885TSHR 3198/4885 |
| US-20240092956-A1 | Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor | ASS1, SETDB1, MAT1A | POLB 1753/4885ALDH1A1 195/4885TSHR 3198/4885 |
| US-11845822-B2 | Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor | ASS1, SETDB1, MAT1A | POLB 1753/4885ALDH1A1 195/4885TSHR 3198/4885 |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | ADH1A, ADH1C, ADH5 | POLB 715/4885ALDH1A1 14/4885TSHR 2043/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.